Inventor

Toshihiro Inayama

Inventor

Mie, JP

Overview

2006–2017

Patent span

Chemistry

Primary field (CPC C)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C07Cprimary

C07CAcyclic or carbocyclic compounds25%

C10MLubricating compositions25%

C10NIndexing scheme associated with subclass c10m relating to lubricating compositions25%

C09KMaterials for miscellaneous applications, not provided for elsewhere14%

C07DHeterocyclic compounds3%

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds3%

C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds3%

C09DCoating compositions, e.g. paints, varnishes or lacquers3%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2006Based in Kuwana, JP· patent location history

2013–2017Patents assigned to KH NEOCHEM CO LTD (9)· patent assignee history

2013–2014Patents assigned to HIYOSHI SATOSHI (4)· patent assignee history

2013–2014Patents assigned to INAYAMA TOSHIHIRO (4)· patent assignee history

2013–2014Patents assigned to AMEMIYA NOBUHITO (3)· patent assignee history

2013–2017Based in Yokkaichi, JP· patent location history

2014Patents assigned to KISHIMOTO SHIGEHISA (2)· patent assignee history

2014–2017Based in Mie, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Locations