Inventor

Mark Whitney Hart

Inventor

San Jose, CA, US

Overview

1998–2020

Patent span

Electricity

Primary field (CPC H)

Patents· 33 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G02Fprimary

G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein11%

B82YSpecific uses or applications of nanostructures9%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices9%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%

C09DCoating compositions, e.g. paints, varnishes or lacquers6%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h105%

B01JChemical or physical processes, e.g. catalysis or colloid chemistry4%

B01LChemical or physical laboratory apparatus for general use4%

B05DProcesses for applying fluent materials to surfaces, in general4%

C08JWorking-up4%

PatentTitleYear

10,770,769Ion conducting hybrid membranes2020 10,170,813Ion conducting hybrid membranes2019 9,520,627'Ion conducting hybrid membranes'2016 9,235,124'Planarization over topography with molecular glass materials'2016 8,759,415'Aromatic vinyl ether based reverse-tone step and flash imprint lithography'2014 8,603,584'Polyhedral oligomeric silsesquioxane based imprint materials and imprint process using polyhedral oligomeric silsesquioxane based imprint materials'2013 8,529,779'Methods for forming surface features using self-assembling masks'2013 8,377,631'Planarization over topography with molecular glass materials'2013 8,262,961'Aromatic vinyl ether based reverse-tone step and flash imprint lithography'2012 8,128,832'Processes and materials for step and flash imprint lithography'2012 8,026,293'Polyhedral oligomeric silsesquioxane based imprint materials and imprint process using polyhedral oligomeric silsesquioxane based imprint materials'2011 7,828,986'Forming surface features using self-assembling masks'2010 7,749,422'Release layer for imprinted photocationic curable resins'2010 7,682,866'Non-planarized, self-aligned, non-volatile phase-change memory array and method of formation'2010 7,651,872'Discrete nano-textured structures in biomolecular arrays, and method of use'2010 7,555,828'Method for manufacturing a read sensor for a magnetoresistive head'2009 7,468,330'Imprint process using polyhedral oligomeric silsesquioxane based imprint materials'2008 7,419,611'Processes and materials for step and flash imprint lithography'2008 7,354,777'Discrete nano-textured structures in biomolecular arrays, and method of use'2008 7,038,231'Non-planarized, self-aligned, non-volatile phase-change memory array and method of formation'2006 7,009,694'Indirect switching and sensing of phase change memory cells'2006 6,962,822'Discrete nano-textured structures in biomolecular arrays, and method of use'2005 6,900,126'Method of forming metallized pattern'2005 6,727,873'Reflective electrophoretic display with stacked color cells'2004 6,680,726'Transmissive electrophoretic display with stacked color cells'2004 6,440,520'Patterned magnetic recording disk with substrate patterned by ion implantation'2002 6,271,823'Reflective electrophoretic display with laterally adjacent color cells using a reflective panel'2001 6,225,971'Reflective electrophoretic display with laterally adjacent color cells using an absorbing panel'2001 6,184,856'Transmissive electrophoretic display with laterally adjacent color cells'2001 6,144,361'Transmissive electrophoretic display with vertical electrodes'2000 5,914,806'Stable electrophoretic particles for displays'1999 5,872,552'Electrophoretic display'1999 5,745,094'Electrophoretic display'1998

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1998–2020Patents assigned to IBM (32)· patent assignee history

1998–2020Based in San Jose, CA, US· patent location history

2012–2014Patents assigned to DIPIETRO RICHARD ANTHONY (4)· patent assignee history

2012–2014Patents assigned to HART MARK WHITNEY (4)· patent assignee history

2012–2014Patents assigned to ITO HIROSHI (4)· patent assignee history

2016–2020Patents assigned to ASAHI CHEMICAL IND (3)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
IBM	32	1998–2020
DIPIETRO RICHARD ANTHONY	4	2012–2014
HART MARK WHITNEYself	4	2012–2014
ITO HIROSHI	4	2012–2014
ASAHI CHEMICAL IND	3	2016–2020

Locations

Location	Patents	Span
San Jose, California, US	33	1998–2020