Inventor
Toru Ishigaki
Inventor
Kawasaki, JP
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G11Cprimary
G11CStatic stores17%
H10BElectronic memory devices17%
G03GElectrography14%
G06FElectric digital data processing8%
H01LSemiconductor devices8%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
Y10TTechnical subjects covered by former us classification6%
B29CShaping or joining of plastics3%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form3%
G06QInformation and communication technology [ict] specially adapted for administrative, commercial, financial, managerial or supervisory purposes3%
PatentTitleYear
9,947,407Techniques for programming of select gates in NAND memory20189,659,656'Techniques for programming of select gates in NAND memory'20179,659,866'Three-dimensional memory structures with low source line resistance'20179,305,648'Techniques for programming of select gates in NAND memory'20168,345,300'Computer readable medium, document processing apparatus, document processing system, and document processing method for managing electronic documents'20138,223,367'Document processing apparatus and method for creating an image of information identifying a document'20128,095,050'Developer level control blade and process for manufacturing developer level control blade'20127,995,394'Program voltage compensation with word line bias change to suppress charge trapping in memory'20117,876,611'Compensating for coupling during read operations in non-volatile storage'20117,305,405'Information providing system and information providing method'20077,074,292'Processes for manufacturing blade member of developer quantity control blade'20067,016,633'Developing assembly featuring a developer-carrying member having specified ranges of deformation and hardness and a developer quality control blade having a rough contact surface'20066,492,229'Semiconductor device having reduced field oxide recess and method of fabrication'20026,177,312'Method for removing contaminate nitrogen from the peripheral gate region of a non-volatile memory device during production of such device'20015,768,670'Developer regulating member having thermoplastic resin layers provided on both sides of a rubber member, method of manufacturing the same, and developing device using the same'19985,689,783'Elastic blade and developing device using the same'19975,619,159'Signal processing device and a method for transmitting signal'1997Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1997–2002Patents assigned to FUJITSU LTD (3)· patent assignee history
1997–2013Based in Kawasaki, JP· patent location history
1997–1998Based in Ibaraki, JP· patent location history
2002–2011Based in Yokohama, JP· patent location history
2006–2012Patents assigned to CANON KASEI KK (3)· patent assignee history
2006Based in Chiba, JP· patent location history
2007–2013Patents assigned to FUJI XEROX CO LTD (3)· patent assignee history
2012–2013Patents assigned to ISHIGAKI TORU (3)· patent assignee history
2016–2018Based in Kanagawa, JP· patent location history
2017–2018Patents assigned to SANDISK TECHNOLOGIES LLC (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CANON KASEI KK | 3 | 2006–2012 |
| FUJI XEROX CO LTD | 3 | 2007–2013 |
| FUJITSU LTD | 3 | 1997–2002 |
| ISHIGAKI TORUself | 3 | 2012–2013 |
| SANDISK TECHNOLOGIES LLC | 3 | 2017–2018 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kawasaki, JP | 4 | 1997–2013 |
| Kanagawa, JP | 3 | 2016–2018 |
| Yokohama, JP | 2 | 2002–2011 |
| Chiba, JP | 2 | 2006 |
| Ibaraki, JP | 2 | 1997–1998 |