Inventor
Tooru Aramaki
Inventor
Tokyo, JP
Overview
Patents· 10 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps23%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
H01LSemiconductor devices14%
C23CCoating metallic material6%
H04MTelephonic communication6%
H04NPictorial communication, e.g. television6%
H04QSelecting6%
H05HPlasma technique6%
C09KMaterials for miscellaneous applications, not provided for elsewhere3%
C23FNon-mechanical removal of metallic material from surface3%
PatentTitleYear
10,930,476Plasma processing device202110,811,231Plasma processing apparatus and plasma processing method202010,804,080Plasma processing apparatus and plasma processing method202010,217,611Plasma processing apparatus and plasma processing method201910,037,909Plasma processing apparatus20189,390,941'Sample processing apparatus, sample processing system, and method for processing sample'20167,947,189'Vacuum processing apparatus and vacuum processing method of sample'20117,303,998'Plasma processing method'20075,745,160'Video conversation/monitoring system having a remote monitoring function'19985,585,839'Audio and video telecommunication system with remote monitoring function and remote device control function'1996Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1996–1998Patents assigned to HITACHI LTD (2)· patent assignee history
1996–1998Based in Yokohama, JP· patent location history
2007–2021Patents assigned to HITACHI HIGH TECH CORP (8)· patent assignee history
2007–2016Based in Kudamatsu, JP· patent location history
2016Patents assigned to ARAMAKI TOORU (1)· patent assignee history
2016Patents assigned to IKEDA NORIHIKO (1)· patent assignee history
2016Patents assigned to KOZUMA YUTAKA (1)· patent assignee history
2018–2021Based in Tokyo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI HIGH TECH CORP | 8 | 2007–2021 |
| HITACHI LTD | 2 | 1996–1998 |
| ARAMAKI TOORUself | 1 | 2016 |
| IKEDA NORIHIKO | 1 | 2016 |
| KOZUMA YUTAKA | 1 | 2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 5 | 2018–2021 |
| Kudamatsu, JP | 3 | 2007–2016 |
| Yokohama, JP | 2 | 1996–1998 |