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Inventor

TUNG-CHING TSENG

Inventor
TW

Overview

2→
Patents
2022
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material17%
G02BOptical elements, systems or apparatus17%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices17%
H01JElectric discharge tubes or discharge lamps17%
H01LSemiconductor devices17%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
PatentTitleYear
11,532,459Chemical vapor deposition apparatus with cleaning gas flow guiding member202211,315,810Apparatus for wafer processing2022

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2022Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (2)· patent assignee history
2022Based in TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TAIWAN SEMICONDUCTOR MFG CO LTD22022
Locations
LocationPatentsSpan
TW22022