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Inventor

Tijmen Wilfred Mathijs Gunther

Inventor
Utrecht, NL

Overview

2→
Patents
2013–2015
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices67%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
PatentTitleYear
9,176,393'Lithographic apparatus and a method of operating the apparatus'20158,508,712'Fluid handling structure, lithographic apparatus and device manufacturing method'2013

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2013–2015Patents assigned to ASML NETHERLANDS BV (2)· patent assignee history
2013–2015Patents assigned to GUNTHER TIJMEN WILFRED MATHIJS (2)· patent assignee history
2013Patents assigned to BESSEMS DAVID (1)· patent assignee history
2013–2015Based in Utrecht, NL· patent location history
2015Patents assigned to CLOIN CHRISTIAN GERARDUS NORBERTUS HENDRICUS MARIE (1)· patent assignee history
2015Patents assigned to ELISSEEVA OLGA VLADIMIROVNA (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV22013–2015
GUNTHER TIJMEN WILFRED MATHIJSself22013–2015
BESSEMS DAVID12013
CLOIN CHRISTIAN GERARDUS NORBERTUS HENDRICUS MARIE12015
ELISSEEVA OLGA VLADIMIROVNA12015
Locations
LocationPatentsSpan
Utrecht, NL22013–2015