Inventor
Chin Teong Lim
Inventor
Clifton Park, NY, US
Overview
Patents· 12 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices27%
G06FElectric digital data processing22%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1014%
Y02PClimate change mitigation technologies in the production or processing of goods11%
H01LSemiconductor devices8%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
G01RMeasuring electric variables5%
H10DInorganic electric semiconductor devices5%
PatentTitleYear
10,002,827Method for selective re-routing of selected areas in a target layer and in adjacent interconnecting layers of an IC device20189,817,940'Method wherein test cells and dummy cells are included into a layout of an integrated circuit'20179,817,927'Hard mask etch and dielectric etch aware overlap for via and metal layers'20179,672,312'Method wherein test cells and dummy cells are included into a layout of an integrated circuit'20179,672,313'Method for selective re-routing of selected areas in a target layer and in adjacent interconnecting layers of an IC device'20179,645,486'Multiple threshold convergent OPC model'20179,606,432'Alternating space decomposition in circuit structure fabrication'20179,535,319'Reticle, system comprising a plurality of reticles and method for the formation thereof'20179,500,945'Pattern classification based proximity corrections for reticle fabrication'20169,384,318'Mask error compensation by optical modeling calibration'20169,329,471'Achieving a critical dimension target based on resist characteristics'20169,250,538'Efficient optical proximity correction repair flow method and apparatus'2016Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2016–2018Patents assigned to GLOBALFOUNDRIES INC (11)· patent assignee history
2016Patents assigned to GLOBALFOUNDRIES SG PTE LTD (1)· patent assignee history
2016–2018Based in Clifton Park, NY, US· patent location history
2016Based in Dresden, DE· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| GLOBALFOUNDRIES INC | 11 | 2016–2018 |
| GLOBALFOUNDRIES SG PTE LTD | 1 | 2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Clifton Park, New York, US | 11 | 2016–2018 |
| Dresden, DE | 1 | 2016 |