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Inventor

Rahul RAJEEV

Inventor
US

Overview

4→
Patents
2023–2025
Patent span
Electricity
Primary field (CPC H)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material22%
H01LSemiconductor devices22%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds11%
C09DCoating compositions, e.g. paints, varnishes or lacquers11%
H01JElectric discharge tubes or discharge lamps11%
PatentTitleYear
12,198,925Systems and methods for depositing low-k dielectric films202512,057,325Gasbox for semiconductor processing chamber202411,694,908Gasbox for semiconductor processing chamber202311,594,409Systems and methods for depositing low-k dielectric films2023

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2023–2025Patents assigned to APPLIED MATERIALS INC (4)· patent assignee history
2023–2025Based in US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
APPLIED MATERIALS INC42023–2025
Locations
LocationPatentsSpan
US42023–2025