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Inventor

Motonobu Hommi

Inventor
Tokyo, JP

Overview

1→
Patents
2017
Patent span
Physics
Primary field (CPC G)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G01Bprimary
G01BMeasuring length, thickness or similar linear dimensions33%
G01NInvestigating or analysing materials by determining their chemical or physical properties33%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
PatentTitleYear
9,804,107'Pattern measurement device and computer program for evaluating patterns based on centroids of the patterns'2017

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2017Patents assigned to HITACHI HIGH TECH CORP (1)· patent assignee history
2017Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HITACHI HIGH TECH CORP12017
Locations
LocationPatentsSpan
Tokyo, JP12017