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Inventor

Robert Franken

Inventor
Deurne, NL

Overview

3→
Patents
1998–2012
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
B01DSeparation13%
B22DCasting of metals13%
C22BProduction and refining of metals13%
G02BOptical elements, systems or apparatus13%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them13%
Y02PClimate change mitigation technologies in the production or processing of goods13%
PatentTitleYear
8,208,118'Method for determining exposure settings, lithographic exposure apparatus, computer program and data carrier'20127,869,022'Inspection method and apparatus lithographic apparatus, lithographic processing cell, device manufacturing method and distance measuring system'20115,741,422'Molten metal filter cartridge'1998

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1998Based in Krimpen aan den Ijssel, NL· patent location history
2011–2012Patents assigned to ASML NETHERLANDS BV (2)· patent assignee history
2011–2012Based in Deurne, NL· patent location history
2012Patents assigned to BRINKHOF RALPH (1)· patent assignee history
2012Patents assigned to BURRY DAVID WARREN (1)· patent assignee history
2012Patents assigned to FRANKEN ROBERT (1)· patent assignee history
2012Patents assigned to KOOP ERIK JOHAN (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV22011–2012
BRINKHOF RALPH12012
BURRY DAVID WARREN12012
FRANKEN ROBERTself12012
KOOP ERIK JOHAN12012
Locations
LocationPatentsSpan
Deurne, NL22011–2012
Krimpen aan den Ijssel, NL11998