Inventor

Hai-Dang Trinh

Inventor
Hsinchu, TW

Overview

29→
Patents
2017–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 29 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Lprimary
H01LSemiconductor devices28%
H10NElectric solid-state devices not otherwise provided for20%
H10BElectronic memory devices13%
G11CStatic stores8%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h107%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
H10DInorganic electric semiconductor devices5%
G06FElectric digital data processing3%
C23CCoating metallic material2%
G06TImage data processing or generation, in general2%
PatentTitleYear
11,131,025Wireless camera wafer for vacuum chamber diagnostics202111,121,208MIM capacitor and method of forming the same202111,101,307Image sensor having stacked conformal films202111,088,239Cap structure for trench capacitors202111,038,101Semiconductor structure having a phase change memory device202111,024,800Film scheme to improve peeling in chalcogenide based PCRAM202111,018,297Memory device structure202110,910,560RRAM structure202110,868,247Semiconductor device structure with multiple resistance variable layers202010,847,718Multi-layer structure to increase crystalline temperature of a selector device202010,818,544Method to enhance electrode adhesion stability202010,811,600Switching layer scheme to enhance RRAM performance202010,804,464Method of forming memory device with diffusion barrier and capping layer202010,796,954Semiconductor structure and method for forming the same202010,748,798Wireless camera wafer for vacuum chamber diagnostics202010,658,581Semiconductor device structure with multiple resistance variable layers202010,622,555Film scheme to improve peeling in chalcogenide based PCRAM202010,505,107Switching layer scheme to enhance RRAM performance201910,497,867Multi-layer structure to increase crystalline temperature of a selector device201910,176,866Recap layer scheme to enhance RRAM performance201910,163,949Image device having multi-layered refractive layer on back surface201810,164,003MIM capacitor and method of forming the same201810,164,182Switching layer scheme to enhance RRAM performance201810,115,896Semiconductor device and method of manufacturing the same20189,978,938Resistive RAM structure and method of fabrication thereof20189,954,166Embedded memory device with a composite top electrode20189,728,597'Metal-insulator-metal structure and method for forming the same'20179,647,207'Resistive random access memory (RRAM) structure'20179,627,613'Resistive random access memory (RRAM) cell with a composite capping layer'2017

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2017–2021Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (29)· patent assignee history
2017–2021Based in Hsinchu, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TAIWAN SEMICONDUCTOR MFG CO LTD292017–2021
Locations
LocationPatentsSpan
Hsinchu, TW292017–2021