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Inventor

Takahiro Kawakatsu

Inventor
Tokyo, JP

Overview

16→
Patents
2000–2021
Patent span
Performing operations
Primary field (CPC B)

Patents· 16 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B01Dprimary
B01DSeparation23%
C02FTreatment of water, waste water, sewage, or sludge15%
C11DDetergent compositions9%
B01FMixing, e.g. dissolving, emulsifying or dispersing6%
A61PSpecific therapeutic activity of chemical compounds or medicinal preparations4%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry4%
B08BCleaning in general4%
Y02ATechnologies for adaptation to climate change4%
Y02WClimate change mitigation technologies related to wastewater treatment or waste management4%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%
PatentTitleYear
11,034,769Anti-EphA4 antibody202110,947,313Anti-EphA4 antibody202110,780,400Agent, liquid, and method for cleaning reverse osmosis membrane202010,583,405Permselective membrane, method for producing same, and water treatment method using the permselective membrane202010,443,023Alkaline cleaning liquid comprising urea and/or biuret, and cleaning method for reverse osmosis membrane201910,307,713Agent and method for cleaning permeable membranes201910,252,219Method for operating reverse osmosis membrane device, and reverse osmosis membrane device201910,239,019Reverse-osmosis-membrane device and method for operating the same201910,046,280Method for improving rejection rate of reverse osmosis membrane20189,498,754'Method for improving rejection of reverse osmosis membrane, treatment agent for improving rejection, and reverse osmosis membrane'20169,136,104'Method for cleaning silicon wafer and apparatus for cleaning silicon wafer'20158,025,159'Agent for increasing rejection with a permeable membrane, process for increasing the rejection, permeable membrane and process for water treatment'20117,540,292'Detergent for washing a selectively permeable membrane and method of washing'20096,258,858'Cross-flow microchannel apparatus and method of producing or separating emulsions making use thereof'20016,177,479'Continuous manufacturing method for microspheres and apparatus'20016,155,710'Method and device for producing emulsions'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2001Patents assigned to AGENCY IND SCIENCE TECHN (2)· patent assignee history
2000–2001Based in Miyagi, JP· patent location history
2001Patents assigned to SASAKI CO (2)· patent assignee history
2009–2020Patents assigned to KURITA WATER IND LTD (11)· patent assignee history
2011Based in Saitama, JP· patent location history
2015–2016Patents assigned to KAWAKATSU TAKAHIRO (2)· patent assignee history
2015–2020Based in Tokyo, JP· patent location history
2016Patents assigned to AOKI TETSUYA (1)· patent assignee history
2020Based in Koga, JP· patent location history
2021Based in Kobe, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
KURITA WATER IND LTD112009–2020
AGENCY IND SCIENCE TECHN22000–2001
KAWAKATSU TAKAHIROself22015–2016
SASAKI CO22001
AOKI TETSUYA12016
Locations
LocationPatentsSpan
Tokyo, JP82015–2020
Miyagi, JP32000–2001
Kobe, JP22021
Koga, JP12020
Saitama, JP12011