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Inventor

Yasutsugu Usami

Inventor
Hitachinaka, JP

Overview

48→
Patents
1995–2015
Patent span
Electricity
Primary field (CPC H)

Patents· 48 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps34%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices14%
G06TImage data processing or generation, in general14%
G01NInvestigating or analysing materials by determining their chemical or physical properties12%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%
B82YSpecific uses or applications of nanostructures6%
G01RMeasuring electric variables5%
H02BBoards, substations or switching arrangements for the supply or distribution of electric power2%
H02PControl or regulation of electric motors, electric generators or dynamo-electric converters2%
G01BMeasuring length, thickness or similar linear dimensions1%
PatentTitleYear
9,159,528'Electron beam apparatus'20158,604,430'Method and an apparatus of an inspection system using an electron beam'20138,212,227'Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus'20128,134,125'Method and apparatus of an inspection system using an electron beam'20127,977,632'Scanning electron microscope'20117,952,074'Method and apparatus for inspecting integrated circuit pattern'20117,692,144'Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus'20107,442,923'Scanning electron microscope'20087,439,506'Method and an apparatus of an inspection system using an electron beam'20087,417,444'Method and apparatus for inspecting integrated circuit pattern'20087,329,889'Electron beam apparatus and method with surface height calculator and a dual projection optical unit'20087,242,015'Patterned wafer inspection method and apparatus therefor'20077,232,996'Method and an apparatus of an inspection system using an electron beam'20077,130,063'Micropattern shape measuring system and method'20067,038,767'Three-dimensional micropattern profile measuring system and method'20067,026,830'Method and apparatus for inspecting integrated circuit pattern'20067,012,252'Method and an apparatus of an inspection system using an electron beam'20066,987,265'Method and an apparatus of an inspection system using an electron beam'20066,979,823'Patterned wafer inspection method and apparatus therefor'20056,919,577'Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus'20056,919,564'Inspection method, apparatus and system for circuit pattern'20056,903,821'Inspection method, apparatus and system for circuit pattern'20056,894,790'Micropattern shape measuring system and method'20056,797,954'Patterned wafer inspection method and apparatus therefor'20046,768,113'WORKPIECE HOLDER, SEMICONDUCTOR FABRICATING APPARATUS, SEMICONDUCTOR INSPECTING APPARATUS, CIRCUIT PATTERN INSPECTING APPARATUS, CHARGED PARTICLE BEAM APPLICATION APPARATUS, CALIBRATING SUBSTRATE, WORKPIECE HOLDING METHOD, CIRCUIT PATTERN INSPECTING METHOD, AND CHARGED PARTICLE BEAM APPLICATION METHOD'20046,759,655'Inspection method, apparatus and system for circuit pattern'20046,753,518'Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus'20046,635,873'Scanning electron microscope with voltage applied to the sample'20036,559,663'Method and apparatus for inspecting integrated circuit pattern'20036,512,227'Method and apparatus for inspecting patterns of a semiconductor device with an electron beam'20036,509,564'WORKPIECE HOLDER, SEMICONDUCTOR FABRICATING APPARATUS, SEMICONDUCTOR INSPECTING APPARATUS, CIRCUIT PATTERN INSPECTING APPARATUS, CHARGED PARTICLE BEAM APPLICATION APPARATUS, CALIBRATING SUBSTRATE, WORKPIECE HOLDING METHOD, CIRCUIT PATTERN INSPECTING METHOD, AND CHARGED PARTICLE BEAM APPLICATION METHOD'20036,504,609'Inspection method, apparatus and system for circuit pattern'20036,493,082'Inspection method, apparatus and system for circuit pattern'20026,480,279'Inspection method, apparatus and system for circuit pattern'20026,476,913'Inspection method, apparatus and system for circuit pattern'20026,452,178'Method and an apparatus of an inspection system using an electron beam'20026,421,122'Inspection method, apparatus and system for circuit pattern'20026,388,747'Inspection method, apparatus and system for circuit pattern'20026,376,854'Method of inspecting a pattern on a substrate'20026,348,690'Method and an apparatus of an inspection system using an electron beam'20026,333,510'Electron beam exposure or system inspection of measurement apparatus and its method and height detection apparatus'20016,329,826'Method and apparatus for inspecting integrated circuit pattern'20016,310,341'Projecting type charged particle microscope and projecting type substrate inspection system'20016,236,057'Method of inspecting pattern and apparatus thereof with a differential brightness image detection'20016,172,363'Method and apparatus for inspecting integrated circuit pattern'20016,107,637'Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus'20006,087,673'Method of inspecting pattern and apparatus thereof'20005,478,195'Process and apparatus for transferring an object and for processing semiconductor wafers'1995

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1995–2013Patents assigned to HITACHI LTD (44)· patent assignee history
2000–2012Based in Hitachinaka, JP· patent location history
2001–2011Based in Toshima-ku, JP· patent location history
2002–2013Based in Saitama-shi, JP· patent location history
2003–2006Based in Tokyo, JP· patent location history
2005–2006Patents assigned to HITACHI HIGH TECH CORP (3)· patent assignee history
2012–2013Patents assigned to SHINADA HIROYUKI (3)· patent assignee history
2012–2013Patents assigned to USAMI YASUTSUGU (3)· patent assignee history
2012–2013Patents assigned to FUKUHARA SATORU (2)· patent assignee history
2015Based in Kanagawa, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HITACHI LTD441995–2013
HITACHI HIGH TECH CORP32005–2006
SHINADA HIROYUKI32012–2013
USAMI YASUTSUGUself32012–2013
FUKUHARA SATORU22012–2013
Locations
LocationPatentsSpan
Hitachinaka, JP272000–2012
Saitama-shi, JP82002–2013
Toshima-ku, JP72001–2011
Tokyo, JP42003–2006
Kanagawa, JP12015