Inventor

Hideto Tozawa

Inventor
Tokyo, JP

Overview

1→
Patents
2016
Patent span
Chemistry
Primary field (CPC C)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B05Dprimary
B05DProcesses for applying fluent materials to surfaces, in general33%
C12MApparatus for enzymology or microbiology33%
C12NMicroorganisms or enzymes33%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2016Patents assigned to DAISANKASEI CO LTD (1)· patent assignee history
2016Patents assigned to FUJII TERUO (1)· patent assignee history
2016Patents assigned to HIRAMA MAKOTO (1)· patent assignee history
2016Patents assigned to INOUE TAKASHI (1)· patent assignee history
2016Patents assigned to KAMIMAE KENTARO (1)· patent assignee history
2016Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
DAISANKASEI CO LTD12016
FUJII TERUO12016
HIRAMA MAKOTO12016
INOUE TAKASHI12016
KAMIMAE KENTARO12016
Locations
LocationPatentsSpan
Tokyo, JP12016