Inventor
Hideaki Sakurai
Inventor
Naka-gun, JP
Overview
Patents· 92 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%
H01LSemiconductor devices7%
C23CCoating metallic material6%
H01BCables5%
H10NElectric solid-state devices not otherwise provided for5%
C04BLime, magnesia5%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices5%
H10DInorganic electric semiconductor devices5%
H01GCapacitors4%
B01DSeparation3%
PatentTitleYear
10,984,922Insulated electric wire, method for manufacturing same, and coil202110,882,082Freeze cleaning apparatus202110,800,942Water-based electrodeposition dispersion for forming insulating film202010,781,320Water-dispersed electrodeposition solution for forming insulating film202010,706,992Insulated flat conductive wire having high aspect ratio, method for manufacturing same, and coil202010,692,715Method for cleaning substrate and substrate processing apparatus202010,672,973Composition for forming Ce-doped PZT-based piezoelectric film202010,546,670Insulated wire with soldered portion and method for manufacturing same202010,532,386Continuous-cast slab, method and apparatus of manufacturing the same, and method and apparatus of manufacturing thick steel plate202010,486,203Substrate production method, substrate processing apparatus, and substrate production system201910,464,110Dust collection apparatus and dust collection system201910,464,024Water treatment device and operating method for water treatment device201910,465,080Water-dispersed electrodeposition solution for forming insulating film201910,407,331Scale detection device and method for concentrating device, and water reclamation processing treatment system201910,411,183Composition for forming Mn-doped PZT-based piezoelectric film and Mn-doped PZT-based piezoelectric film201910,395,798Heat-resistant insulated wire and electrodeposition liquid used to form insulating layer therefor201910,252,300Cleaning device and cleaning method for hydraulic oil tube in aircraft201910,241,394Pattern formation method, control device, and semiconductor device manufacture method201910,195,827Ferroelectric film and method of producing same201910,160,671Water treatment process and water treatment system201810,139,033Resin coating layer and life-extension method for piping201810,138,147Water treatment device201810,112,872Composition for forming Mn and Nb co-doped PZT-based piezoelectric film201810,029,929Water treatment process and water treatment system201810,024,609Steel covering layer and method of surface treatment of heat transfer tube201810,010,925Swage apparatus and swage method201810,005,101Method of forming PNbZT ferroelectric thin film20189,969,629Water treatment process and water treatment system20189,950,936Water treatment process and water treatment system20189,950,959Composition for forming Mn and Nb co-doped PZT-based piezoelectric film20189,947,436Insulated electric wire and method for manufacturing same20189,914,653'Water treatment process and water treatment system'20189,914,652'Water treatment process and water treatment system'20189,905,417'Composition for forming ferroelectric thin film, and method for manufacturing same'20189,841,674'Patterning method, and template for nanoimprint and producing method thereof'20179,799,821'Silicon substrate having ferroelectric film attached thereto'20179,666,331'Ferroelectric thin film-forming sol-gel solution'20179,595,393'Dielectric-thin-film forming composition, method of forming dielectric thin film, and dielectric thin film formed by the method'20179,502,636'Composition for ferroelectric thin film formation, method for forming ferroelectric thin film, and ferroelectric thin film formed by the method thereof'20169,412,485'LaNiO3 thin film-forming composition and method of forming LaNiO3 thin film using the same'20169,289,720'System and method for treating mercury in flue gas'20169,251,955'PZT-based ferroelectric thin film and method of forming the same'20169,244,343'Pattern forming method and mask pattern data'20169,228,091'Ferrite thin film-forming composition material, method of forming ferrite thin film, and ferrite thin film formed using the same'20169,116,431'Development processing apparatus'20159,093,198'Method of producing ferroelectric thin film-forming composition and application of the same'20159,059,406'PZT-based ferroelectric thin film and method of manufacturing the same'20159,059,405'Ferroelectric thin film-forming sol-gel solution'20159,040,312'Method for producing ferroelectric thin film'20159,018,118'Dielectric thin film-forming composition, method of forming dielectric thin film and dielectric thin film formed by the method'20159,017,770'Method of manufacturing ferroelectric thin film'20159,005,358'Composition for ferroelectric thin film formation, method for forming ferroelectric thin film, and ferroelectric thin film formed by the method thereof'20158,956,689'Method for producing ferroelectric thin film'20158,951,698'Method for forming pattern and method for producing original lithography mask'20158,951,603'Method for producing ferroelectric thin film'20158,908,150'Substrate processing method, manufacturing method of EUV mask, and EUV mask'20148,891,227'Process of forming dielectric thin film and thin film capacitor having said dielectric thin film'20148,859,051'Composition for ferroelectric thin film formation, method for forming ferroelectric thin film and ferroelectric thin film formed by the method thereof'20148,790,538'Composition for ferroelectric thin film formation, method for forming ferroelectric thin film, and ferroelectric thin film formed by the method thereof'20148,696,108'Printing press'20148,672,563'Development method, method of manufacturing photomask, method of manufacturing semiconductor device and development device'20148,648,992'Method for manufacturing thin film capacitor and thin film capacitor obtained by the same'20148,501,560'Method for manufacturing thin film capacitor and thin film capacitor obtained by the same'20138,383,298'Substrate processing method, manufacturing method of EUV mask, and EUV mask'20138,025,732'Apparatus for processing a substrate'20118,017,287'Development method, method of manufacturing photomask, and method of manufacturing semiconductor device'20117,608,368'Pattern forming method, photomask manufacturing method, semiconductor device manufacturing method, and computer program product'20097,390,365'Developing method, substrate treating method, and substrate treating apparatus'20087,354,869'Substrate processing method, substrate processing apparatus, and semiconductor device manufacturing method'20087,205,094'Coating fluid for printing plates and method of making a printing plate'20077,138,350'MgO vapor deposition material and method for preparation thereof'20067,094,522'Developing method, substrate treating method, and substrate treating apparatus'20067,070,903'Coating formulation for printing plate precursor, printing plate precursor, printing press, fabrication process of printing plate, and regeneration process of printing plate'20067,001,086'Developing method, substrate treating method, and substrate treating apparatus'20066,995,104'Polycrystalline MgO deposition material having adjusted Si concentration'20066,978,715'Printing press, and apparatus and process for regenerating printing plate'20056,965,125'Protective film for FPD, vapor deposition material for protective film and its production method, FPD, and manufacturing device for FPD protective film'20056,929,903'Developing method, substrate treating method, and substrate treating apparatus'20056,872,115'Blade with comb teeth coated with a compound layer for forming ribs and its production method'20056,828,588'Protective film for FPD, vapor deposition material for protective film and its production method, FPD, and manufacturing device for FPD protective film'20046,821,616'Protective thin film for FPDS, method for producing said thin film and FPDS using said thin film'20046,818,373'Coating fluid for printing plates and method of making a printing plate'20046,680,462'Heat treating method and heat treating apparatus'20046,550,990'Substrate processing apparatus and processing method by use of the apparatus'20036,495,807'Heat treating method and heat treating apparatus'20026,483,083'Heat treatment method and a heat treatment apparatus for controlling the temperature of a substrate surface'20026,333,493'Heat treating method and heat treating apparatus'20016,265,696'Heat treatment method and a heat treatment apparatus for controlling the temperature of a substrate surface'20016,265,126'Hydrophobic metal oxide powder and application thereof'20015,857,236'Wiper apparatus with pressure dispersing means'19995,816,661'Vehicle seat structure'19984,269,043'Coupling for resiliently connecting two shafts for transmission of torque'1981Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2001–2021Patents assigned to MITSUBISHI MATERIALS CORP (41)· patent assignee history
2001–2016Patents assigned to TOSHIBA KK (20)· patent assignee history
2001–2011Based in Yokohama, JP· patent location history
2004–2019Patents assigned to MITSUBISHI HEAVY IND LTD (16)· patent assignee history
2005–2020Based in Naka-gun, JP· patent location history
2011–2021Based in Kanagawa, JP· patent location history
2013–2017Patents assigned to SAKURAI HIDEAKI (11)· patent assignee history
2013–2017Patents assigned to SOYAMA NOBUYUKI (7)· patent assignee history
2014–2020Based in Naka, JP· patent location history
2016–2019Based in Tokyo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MITSUBISHI MATERIALS CORP | 41 | 2001–2021 |
| TOSHIBA KK | 20 | 2001–2016 |
| MITSUBISHI HEAVY IND LTD | 16 | 2004–2019 |
| SAKURAI HIDEAKIself | 11 | 2013–2017 |
| SOYAMA NOBUYUKI | 7 | 2013–2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| Naka-gun, JP | 18 | 2005–2020 |
| Naka, JP | 14 | 2014–2020 |
| Tokyo, JP | 14 | 2016–2019 |
| Yokohama, JP | 13 | 2001–2011 |
| Kanagawa, JP | 10 | 2011–2021 |