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Inventor

Yutaka Nomura

Inventor
Chiba, JP

Overview

30→
Patents
1980–2018
Patent span
Chemistry
Primary field (CPC C)

Patents· 30 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C07Dprimary
C07DHeterocyclic compounds20%
A61PSpecific therapeutic activity of chemical compounds or medicinal preparations8%
A61KPreparations for medical, dental or toiletry purposes7%
C09GPolishing compositions4%
C09KMaterials for miscellaneous applications, not provided for elsewhere4%
H01LSemiconductor devices4%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h104%
Y10TTechnical subjects covered by former us classification4%
B24BMachines, devices, or processes for grinding or polishing3%
C07CAcyclic or carbocyclic compounds3%
PatentTitleYear
9,873,771Film-like epoxy resin composition, method of producing film-like epoxy resin composition, and method of producing semiconductor device20189,447,306'CMP polishing fluid, method for manufacturing same, method for manufacturing composite particle, and method for polishing base material'20169,285,275'Apparatus and method for measuring the intensity and phase of a light pulse'20168,791,019'Metal polishing slurry and method of polishing a film to be polished'20148,607,443'Method of manufacturing a connector chip'20138,288,282'Polishing liquid for metal and method of polishing'20128,193,899'Chip-like electric component and method for manufacturing the same'20127,825,769'Terminal structure of chiplike electric component'20107,369,120'Input pointer and input device'20086,706,705'Quinazoline derivatives'20046,689,785'Epoxysuccinamide derivatives'20046,387,908'Epoxysuccinamide derivatives'20026,150,363'Dihydrophenazinecarboxylic acid derivatives'20005,843,992'Epoxysuccinic acid derivatives'19985,773,437'Alkylenediamine derivatives'19985,693,651'Quinoline derivatives'19975,587,132'Method for producing high purity vanadium electrolytic solution'19965,576,341'2-[[2-(N-isobutyl-N-methyl)amino]benzylsulfinyl]-benzimidazole as antimicrobial agent'19965,382,689'Process for preparation of bevantolol hydrochloride'19955,180,836'Imidazole derivatives'19935,106,976'Fused pyrazine sulfoxide derivatives for use as antiulcer agents'19925,091,403'Sulfinyl imidazole derivatives and antiulcer agents containing the same'19925,082,943'Novel imidazole derivatives'19924,957,819'Frameless and coreless porous endosseous implant'19904,933,458'Certain gastric acid secretion inhibiting sulfoxides'19904,824,856'Method of protecting gastrointestinal tract'19894,605,742'Process for the production of piperidine'19864,479,017'Process for producing ether compounds by catalytic hydrogenolysis'19844,244,322'Magnetic brush type developing apparatus'19814,185,910'Photoconductive member cleaning device using a magnetic brush for electrostatic copying machines'1980

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1980–1981Based in Yokohama, JP· patent location history
1984–1986Patents assigned to MITSUBISHI PETROCHEMICAL CO (2)· patent assignee history
1989–2004Patents assigned to NIPPON CHEMIPHAR CO (15)· patent assignee history
1989–2004Based in Noda, JP· patent location history
1992–2004Based in Chiba, JP· patent location history
2010–2013Based in Toyama, JP· patent location history
2012–2016Patents assigned to NOMURA YUTAKA (5)· patent assignee history
2012–2018Patents assigned to HITACHI CHEMICAL CO LTD (4)· patent assignee history
2012–2013Patents assigned to HOKURIKU ELECT IND (2)· patent assignee history
2012–2016Based in Hitachi, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NIPPON CHEMIPHAR CO151989–2004
NOMURA YUTAKAself52012–2016
HITACHI CHEMICAL CO LTD42012–2018
HOKURIKU ELECT IND22012–2013
MITSUBISHI PETROCHEMICAL CO21984–1986
Locations
LocationPatentsSpan
Chiba, JP91992–2004
Noda, JP61989–2004
Hitachi, JP32012–2016
Toyama, JP32010–2013
Yokohama, JP21980–1981