Inventor
AVGERINOS V. GELATOS
Inventor
US
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1023%
C23CCoating metallic material17%
H01LSemiconductor devices17%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1014%
H01JElectric discharge tubes or discharge lamps13%
H10DInorganic electric semiconductor devices11%
B82YSpecific uses or applications of nanostructures2%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium2%
H05HPlasma technique2%
PatentTitleYear
12,577,655Methods for selective molybdenum deposition202612,571,100Atomic layer deposition of molybdenum silicide thin films202612,565,702Method of selective metal deposition using separated reactant activation and plasma discharging zone2026D1115720Lower edge ring of a process kit for semiconductor substrate processing2026D1115719Lower edge ring of a process kit for semiconductor substrate processing202612,529,147Low-k and tantalum nitride barrier recovery using a soak process202612,406,849Methods and apparatus for enhancing selectivity of titanium and titanium silicides during chemical vapor deposition202512,356,705Electrical contact cavity structure and methods of forming the same202512,293,902Process kit for a substrate support202512,281,387Method of depositing metal films202512,094,785Dual silicide process using ruthenium silicide202411,887,855Methods for depositing fluorine/carbon-free conformal tungsten202411,776,806Multi-step pre-clean for selective metal gap fill202311,658,014Apparatuses and methods of protecting nickel and nickel containing components with thin films202311,598,003Substrate processing chamber having heated showerhead assembly202311,430,661Methods and apparatus for enhancing selectivity of titanium and titanium silicides during chemical vapor deposition202211,387,134Process kit for a substrate support202211,380,536Multi-step pre-clean for selective metal gap fill202211,355,391Method for forming a metal gapfill2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2026Patents assigned to APPLIED MATERIALS INC (19)· patent assignee history
2022–2026Based in US· patent location history
2026Patents assigned to UNIV WAYNE STATE (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 19 | 2022–2026 |
| UNIV WAYNE STATE | 1 | 2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 19 | 2022–2026 |