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Inventor

YOSHITAKA ABE

Inventor
JP

Overview

4→
Patents
2023–2025
Patent span
Chemistry
Primary field (CPC C)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material18%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1018%
B05BSpraying apparatus12%
C30BSingle-crystal growth12%
F16LPipes12%
H01LSemiconductor devices12%
B60RVehicles, vehicle fittings, or vehicle parts, not otherwise provided for6%
F27BFurnaces, kilns, ovens or retorts in general6%
G06FElectric digital data processing6%
PatentTitleYear
12,467,689Furnace opening structure, substrate processing apparatus and method of manufacturing semiconductor device202512,141,569Redundant system and load drive control device202411,986,847Nozzle installation jig202411,633,753Nozzle installation jig2023

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2023–2025Patents assigned to KOKUSAI ELECTRIC CORP (3)· patent assignee history
2023–2025Based in JP· patent location history
2024Patents assigned to HITACHI ASTEMO LTD (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
KOKUSAI ELECTRIC CORP32023–2025
HITACHI ASTEMO LTD12024
Locations
LocationPatentsSpan
JP42023–2025