Inventor
Sangjun Cho
Inventor
Pleasanton, CA, US
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1044%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices22%
H01LSemiconductor devices22%
H01JElectric discharge tubes or discharge lamps11%
PatentTitleYear
10,546,756Method for generating vertical profiles in organic layer etches20208,912,633'In-situ photoresist strip during plasma etching of active hard mask'20148,283,255'In-situ photoresist strip during plasma etching of active hard mask'20127,782,591'Methods of and apparatus for reducing amounts of particles on a wafer during wafer de-chucking'2010Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2010–2020Patents assigned to LAM RES CORP (4)· patent assignee history
2010–2014Based in Pleasanton, CA, US· patent location history
2012–2014Patents assigned to CHO SANGJUN (2)· patent assignee history
2012–2014Patents assigned to CHOI TOM (2)· patent assignee history
2012–2014Patents assigned to GOPALADASU PRABHAKARA (2)· patent assignee history
2012–2014Patents assigned to HAN TAEJOON (2)· patent assignee history
2020Based in San Ramon, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| LAM RES CORP | 4 | 2010–2020 |
| CHO SANGJUNself | 2 | 2012–2014 |
| CHOI TOM | 2 | 2012–2014 |
| GOPALADASU PRABHAKARA | 2 | 2012–2014 |
| HAN TAEJOON | 2 | 2012–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Pleasanton, California, US | 3 | 2010–2014 |
| San Ramon, California, US | 1 | 2020 |