Inventor

Sung-Eun Hong

Inventor

Kyungki-do, KR

Overview

2001–2021

Patent span

Chemistry

Primary field (CPC C)

Patents· 35 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices23%

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds19%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests10%

C07CAcyclic or carbocyclic compounds10%

C09DCoating compositions, e.g. paints, varnishes or lacquers5%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h105%

Y10TTechnical subjects covered by former us classification4%

C07DHeterocyclic compounds2%

C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium2%

C07JSteroids2%

PatentTitleYear

11,050,026Spiro compound and organic light-emitting element comprising same2021 11,031,560Compound and organic electronic element comprising same2021 7,887,772'Ultrafine porous graphitic carbon fiber and preparation method thereof'2011 7,799,513'Process for preventing development defect and composition for use in the same'2010 7,745,077'Composition for coating over a photoresist pattern'2010 7,745,093'Water soluble resin composition and method for pattern formation using the same'2010 7,335,464'Water soluble resin composition, method of pattern formation and method of inspecting resist pattern'2008 7,329,477'Process for forming a fine pattern using a top-coating composition for a photoresist and product formed by same'2008 7,150,961'Additive for photoresist composition for resist flow process'2006 6,984,482'Top-coating composition for photoresist and process for forming fine pattern using the same'2006 6,956,091'Organic anti-reflective polymer and preparation thereof'2005 6,797,451'Reflection-inhibiting resin used in process for forming photoresist pattern'2004 6,780,953'Organic polymer for anti-reflective coating layer and preparation thereof'2004 6,770,414'Additive for photoresist composition for resist flow process'2004 6,770,720'Organic polymer for organic anti-reflective coating layer and preparation thereof'2004 6,699,644'Process for forming a photoresist pattern comprising alkaline treatment'2004 6,664,031'Process for forming photoresist pattern by using gas phase amine treatment'2003 6,610,616'Method for forming micro-pattern of semiconductor device'2003 6,602,650'Organic anti-reflective coating polymer, anti-reflective coating composition comprising the same and methods of preparation thereof'2003 6,599,678'Organic anti-reflective coating polymer, anti-reflective coating composition comprising the same and method of preparation thereof'2003 6,593,446'Organic polymer for organic anti-reflective coating layer and preparation thereof'2003 6,582,883'Organic anti-reflective coating polymer, anti-reflective coating composition and methods of preparation thereof'2003 6,562,925'Organic anti-reflective coating polymer, anti-reflective coating composition and methods of preparation thereof'2003 6,548,613'Organic anti-reflective coating polymer and preparation thereof'2003 6,538,090'Organic anti-reflective polymer and method for manufacturing thereof'2003 6,492,441'Anti reflective coating polymers and the preparation method thereof'2002 6,489,432'Organic anti-reflective coating polymer and preparation thereof'2002 6,489,423'Organic anti-reflective polymer and method for manufacturing thereof'2002 6,486,283'Organic anti-reflective coating polymer, anti-reflective coating composition methods of preparation thereof'2002 6,423,797'Anti-reflective coating polymers from p-tosylmethylacrylamide and preparation method'2002 6,395,397'Organic anti-reflective coating polymer and preparation thereof'2002 6,388,039'Organic anti-reflective polymer and method for manufacturing thereof'2002 6,368,768'Organic anti-reflective coating material and its preparation'2002 6,350,818'Anti reflective coating polymers and the preparation method thereof'2002 6,309,790'Organic anti-reflective coating material and its preparation'2001

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2001–2005Patents assigned to HYUNDAI ELECTRONICS IND (16)· patent assignee history

2001–2006Based in Kyungki-do, KR· patent location history

2002–2008Patents assigned to HYNIX SEMICONDUCTOR INC (12)· patent assignee history

2002–2005Based in Seongnam-si, KR· patent location history

2003–2008Based in Kumi-shi, KR· patent location history

2008–2010Patents assigned to AZ ELECTRONIC MATERIALS USA (4)· patent assignee history

2008–2010Based in Kakegawa, JP· patent location history

2011Patents assigned to KOREA INST SCI & TECH (1)· patent assignee history

2021Patents assigned to LG CHEMICAL LTD (2)· patent assignee history

2021Based in Daejeon, KR· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
HYUNDAI ELECTRONICS IND	16	2001–2005
HYNIX SEMICONDUCTOR INC	12	2002–2008
AZ ELECTRONIC MATERIALS USA	4	2008–2010
LG CHEMICAL LTD	2	2021
KOREA INST SCI & TECH	1	2011

Locations

Location	Patents	Span
Kyungki-do, KR	18	2001–2006
Kumi-shi, KR	5	2003–2008
Seongnam-si, KR	4	2002–2005
Daejeon, KR	2	2021
Kakegawa, JP	2	2008–2010