Inventor
Yan Du
Inventor
Santa Clara, CA, US
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1044%
G06FElectric digital data processing11%
H01JElectric discharge tubes or discharge lamps11%
H04LTransmission of digital information, e.g. telegraphic communication11%
H10BElectronic memory devices11%
H10DInorganic electric semiconductor devices11%
PatentTitleYear
11,010,149Shared middleware layer containers20217,964,512'Method for etching high dielectric constant materials'20117,780,862'Device and method for etching flash memory gate stacks comprising high-k dielectric'20107,504,338'Method of pattern etching a silicon-containing hard mask'20096,933,243'High selectivity and residue free process for metal on thin dielectric gate etch application'2005Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2005–2011Patents assigned to APPLIED MATERIALS INC (4)· patent assignee history
2005Based in San Jose, CA, US· patent location history
2009Based in Sunnyvale, CA, US· patent location history
2010–2011Based in Santa Clara, CA, US· patent location history
2021Patents assigned to IBM (1)· patent assignee history
2021Based in Beijing, CN· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 4 | 2005–2011 |
| IBM | 1 | 2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| Santa Clara, California, US | 2 | 2010–2011 |
| Beijing, CN | 1 | 2021 |
| Sunnyvale, California, US | 1 | 2009 |
| San Jose, California, US | 1 | 2005 |