Inventor
Russell A. Benson
Inventor
Boise, ID, US
Overview
Patents· 9 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Bprimary
H10BElectronic memory devices32%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1024%
H10DInorganic electric semiconductor devices20%
H01LSemiconductor devices12%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%
C09KMaterials for miscellaneous applications, not provided for elsewhere4%
PatentTitleYear
10,134,741Methods of forming an elevationally extending conductor laterally between a pair of conductive lines20189,754,946'Methods of forming an elevationally extending conductor laterally between a pair of conductive lines'20179,276,001'Semiconductor device and method for manufacturing the same'20168,614,151'Method of etching a high aspect ratio contact'20138,309,413'Methods of forming capacitors'20128,030,156'Methods of forming DRAM arrays'20117,919,863'Semiconductor constructions'20117,700,469'Methods of forming semiconductor constructions'20107,648,872'Methods of forming DRAM arrays'2010Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2010–2018Patents assigned to MICRON TECHNOLOGY INC (8)· patent assignee history
2010–2018Based in Boise, ID, US· patent location history
2012–2013Patents assigned to BENSON RUSSELL A (2)· patent assignee history
2013Patents assigned to KIEHLBAUCH MARK (1)· patent assignee history
2016Patents assigned to BENSON RUSSELL (1)· patent assignee history
2016Patents assigned to NANYA TECHNOLOGY CORP (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MICRON TECHNOLOGY INC | 8 | 2010–2018 |
| BENSON RUSSELL Aself | 2 | 2012–2013 |
| BENSON RUSSELLself | 1 | 2016 |
| KIEHLBAUCH MARK | 1 | 2013 |
| NANYA TECHNOLOGY CORP | 1 | 2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Boise, ID, US | 9 | 2010–2018 |