Inventor

Stig Bieling

Inventor

Aalen, DE

Overview

2012–2021

Patent span

Physics

Primary field (CPC G)

Patents· 19 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%

G02BOptical elements, systems or apparatus34%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%

G21KHandling of particles or ionising radiation not otherwise provided for5%

H05GX-ray technique3%

PatentTitleYear

11,003,086Illumination optical device for projection lithography2021 10,948,828Illumination optical element for projection lithography2021 10,599,041Facet mirror2020 10,409,167Method for illuminating an object field of a projection exposure system2019 10,394,129Microlithographic illumination unit2019 10,324,380Projection exposure apparatus and method for measuring an imaging aberration2019 10,146,136Reflecting coating with optimized thickness2018 10,133,182Illumination optical assembly for a projection exposure apparatus2018 10,018,917Illumination optical unit for EUV projection lithography2018 9,983,482Radiation collector, radiation source and lithographic apparatus2018 9,983,484Illumination optical unit for EUV projection lithography2018 9,983,483Illumination system of a microlithographic projection exposure apparatus2018 9,874,819Mirror array2018 9,791,784'Assembly for a projection exposure apparatus for EUV projection lithography'2017 9,477,157'Illumination system of a microlithographic projection exposure apparatus'2016 9,046,786'Illumination system of a microlithographic projection exposure apparatus'2015 8,395,754'Illumination optical unit for EUV microlithography'2013 8,345,219'Method and apparatus for setting an illumination optical unit'2013 8,294,877'Illumination optical unit for projection lithography'2012

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2012–2021Patents assigned to ZEISS CARL SMT GMBH (19)· patent assignee history

2012–2015Patents assigned to BIELING STIG (4)· patent assignee history

2012–2015Patents assigned to DEGUENTHER MARKUS (2)· patent assignee history

2012–2021Based in Aalen, DE· patent location history

2013Patents assigned to DOERN SEBASTIAN (1)· patent assignee history

2018Patents assigned to ASML NETHERLANDS BV (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
ZEISS CARL SMT GMBH	19	2012–2021
BIELING STIGself	4	2012–2015
DEGUENTHER MARKUS	2	2012–2015
ASML NETHERLANDS BV	1	2018
DOERN SEBASTIAN	1	2013

Locations

Location	Patents	Span
Aalen, DE	19	2012–2021