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Inventor

Hiroo Aoki

Inventor
Shunan-shi, JP

Overview

2→
Patents
2008–2010
Patent span
Chemistry
Primary field (CPC C)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C01Bprimary
C01BNon-metallic elements18%
G03GElectrography18%
Y10TTechnical subjects covered by former us classification18%
B82YSpecific uses or applications of nanostructures9%
C01PIndexing scheme relating to structural and physical aspects of solid inorganic compounds9%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients9%
C09CTreatment of inorganic materials, other than fibrous fillers, to enhance their pigmenting or filling properties9%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h109%
PatentTitleYear
7,803,341'Fine dry silica particles'20107,452,599'Fine silica particles having specific fractal structure parameter'2008

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2008–2010Patents assigned to TOKUYAMA CORP (2)· patent assignee history
2008Based in Yamaguchi, JP· patent location history
2010Based in Shunan-shi, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKUYAMA CORP22008–2010
Locations
LocationPatentsSpan
Shunan-shi, JP12010
Yamaguchi, JP12008