Inventor
Takaya Nakabayashi
Inventor
Nishikamo-gun, JP
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B41Jprimary
B41JTypewriters12%
H05KPrinted circuits12%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1012%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems6%
B82YSpecific uses or applications of nanostructures6%
C30BSingle-crystal growth6%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein6%
G11BInformation storage based on relative movement between record carrier and transducer6%
H01FMagnets6%
H10DInorganic electric semiconductor devices6%
PatentTitleYear
7,501,156'Pattern formation substrate and method for pattern formation'20097,342,288'Thin film transistor, liquid crystal display apparatus, manufacturing method of thin film transistor, and manufacturing method of liquid crystal display apparatus'20087,119,026'Basic material for patterning and patterning method'20066,475,278'Molecular beam source and molecular beam epitaxy apparatus'20025,862,021'Magnetoresistive effect device utilizing an oxide layer adjacent one of the magnetic layers'1999Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1999–2009Patents assigned to SHARP KK (5)· patent assignee history
1999–2009Based in Nishikamo-gun, JP· patent location history
2002Based in Mie, JP· patent location history
2006–2008Based in Iga, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHARP KK | 5 | 1999–2009 |
Locations
| Location | Patents | Span |
|---|---|---|
| Nishikamo-gun, JP | 2 | 1999–2009 |
| Iga, JP | 2 | 2006–2008 |
| Mie, JP | 1 | 2002 |