Inventor
Kazunari Saitou
Inventor
Mobara, JP
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%
H10DInorganic electric semiconductor devices24%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests24%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein6%
G09GArrangements or circuits for control of indicating devices using static means to present variable information6%
H01LSemiconductor devices6%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h106%
PatentTitleYear
10,134,662Mounting substrate and method of manufacturing the same20187,790,554'Method of manufacturing semiconductor integrated circuit device with high and low breakdown-voltage MISFETs'20107,541,661'Semiconductor integrated circuit device with high and low breakdown-voltage MISFETs'20097,224,037'Semiconductor integrated circuit device with high and low breakdown-voltage MISFETs'20077,102,609'Liquid crystal display'20066,780,717'Semiconductor integrated circuit device and method of manufacturing the same'2004Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2004–2010Patents assigned to RENESAS TECH CORP (4)· patent assignee history
2004–2006Patents assigned to HITACHI DEVICE ENG (2)· patent assignee history
2004–2010Based in Mobara, JP· patent location history
2018Patents assigned to SONY CORP (1)· patent assignee history
2018Based in Kanagawa, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| RENESAS TECH CORP | 4 | 2004–2010 |
| HITACHI DEVICE ENG | 2 | 2004–2006 |
| SONY CORP | 1 | 2018 |
Locations
| Location | Patents | Span |
|---|---|---|
| Mobara, JP | 5 | 2004–2010 |
| Kanagawa, JP | 1 | 2018 |