Inventor
Jon MacErnie
Inventor
Chandler, AZ, US
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1042%
B24BMachines, devices, or processes for grinding or polishing25%
C23CCoating metallic material17%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests17%
PatentTitleYear
6,368,183'Wafer cleaning apparatus and associated wafer processing methods'20026,364,745'Mapping system for semiconductor wafer cassettes'20026,350,177'Combined CMP and wafer cleaning apparatus and associated methods'20026,213,853'Integral machine for polishing, cleaning, rinsing and drying workpieces'20016,125,861'Post-CMP wet-HF cleaning station'20005,897,380'Method for isolating a susceptor heating element from a chemical vapor deposition environment'19995,562,947'Method and apparatus for isolating a susceptor heating element from a chemical vapor deposition environment'1996Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1996Patents assigned to MATERIALS RESEARCH CORP (1)· patent assignee history
1996Patents assigned to SONY CORP (1)· patent assignee history
1996–2002Based in Chandler, AZ, US· patent location history
1999Patents assigned to TOKYO ELECTRON LTD (1)· patent assignee history
2000–2002Patents assigned to SPEEDFAM IPEC CORP (5)· patent assignee history
2002Based in Gilbert, AZ, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SPEEDFAM IPEC CORP | 5 | 2000–2002 |
| MATERIALS RESEARCH CORP | 1 | 1996 |
| SONY CORP | 1 | 1996 |
| TOKYO ELECTRON LTD | 1 | 1999 |
Locations
| Location | Patents | Span |
|---|---|---|
| Chandler, AZ, US | 6 | 1996–2002 |
| Gilbert, AZ, US | 1 | 2002 |