LexDanaLexDanabeta
Inventor

Kenji Nishi

Inventor
Yokohama, JP

Overview

146→
Patents
1987–2021
Patent span
Physics
Primary field (CPC G)

Patents· 146 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices62%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
G02BOptical elements, systems or apparatus3%
G01BMeasuring length, thickness or similar linear dimensions3%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them2%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests2%
A61KPreparations for medical, dental or toiletry purposes1%
H01LSemiconductor devices1%
Y10TTechnical subjects covered by former us classification1%
A23KFodder0%
PatentTitleYear
10,892,176Substrate processing apparatus having top plate with through hole and substrate processing method20219,603,002'Method for switching a subscription from a first MNO to a second MNO'20179,305,767'Liquid processing apparatus, liquid processing method and storage medium'20168,289,230'Image display device and image display system'20127,738,179'Image display device using P-polarized light and S-polarized light'20107,688,305'Information inputting tool, storage device, information inputting device, and information processing equipment'20107,256,869'Exposure apparatus and an exposure method'20077,177,008'Exposure apparatus and method'20077,126,689'Exposure method, exposure apparatus, and method for producing device'20067,068,444'Image display unit and projection optical system'20067,068,350'Exposure apparatus and stage device, and device manufacturing method'20067,037,377'Process for producing lacturose-containing powder composition, lacturose-containing powder composition obtained by the process and feed additive'2006RE039083'Projection exposure apparatus'2006RE038798'Projection exposure apparatus'20056,937,319'Exposure method and apparatus with vibration-preventative control'20056,906,782'Stage apparatus, scanning type exposure apparatus, and device produced with the same'20056,900,879'Projection exposure apparatus'20056,894,449'Vibration control device, stage device and exposure apparatus'20056,891,603'Manufacturing method in manufacturing line, manufacturing method for exposure apparatus, and exposure apparatus'20056,885,437'Mask exchanging method and exposure apparatus'20056,870,598'Projection exposure apparatus'20056,864,955'Stage apparatus, exposure apparatus and method for exposing substrate plate'20056,853,443'Exposure apparatus, substrate processing system, and device manufacturing method'20056,841,323'Mask producing method'20056,836,093'Exposure method and apparatus'20046,813,000'Exposure method and apparatus'20046,803,992'Projection exposure apparatus'20046,798,491'Exposure apparatus and an exposure method'20046,765,647'Exposure method and device'20046,741,332'Stage system, exposure apparatus, and device manufacturing method'20046,727,978'Projection exposure apparatus and projection exposure method'20046,707,536'Projection exposure apparatus'20046,704,090'Exposure method and exposure apparatus'20046,700,667'Exposure apparatus and method'20046,690,450'Exposure method, exposure apparatus, method for producing exposure apparatus, and method for producing device'20046,667,796'Exposure method and apparatus'20036,654,095'Exposure apparatus, exposure method, and device manufacturing method'20036,653,025'Mask producing method'20036,654,097'Projection exposure apparatus'2003RE038320'Projection exposure apparatus wherein focusing of the apparatus is changed by controlling the temperature of a lens element of the projection optical system'20036,624,433'Method and apparatus for positioning substrate and the like'20036,608,665'Scanning exposure apparatus having adjustable illumination area and methods related thereto'20036,608,681'Exposure method and apparatus'20036,597,430'Exposure method, illuminating device, and exposure system'20036,590,634'Exposure apparatus and method'20036,590,633'Stage apparatus and method for producing circuit device utilizing the same'20036,590,636'Projection exposure method and apparatus'20036,590,637'Exposure apparatus and method'20036,587,201'Aligning apparatus and method for aligning mask patterns with regions on a substrate'20036,577,382'Substrate transport apparatus and method'20036,563,565'Apparatus and method for projection exposure'2003RE038113'Method of driving mask stage and method of mask alignment'2003RE038085'Exposure method and projection exposure apparatus'20036,549,268'Exposure method and apparatus'20036,549,269'Exposure apparatus and an exposure method'20036,545,746'Projection exposure apparatus'2003RE038038'Exposure method and projection exposure apparatus'20036,522,386'Exposure apparatus having projection optical system with aberration correction element'2003RE037946'Exposure method and projection exposure apparatus'20026,498,352'Method of exposing and apparatus therefor'20026,486,955'Shape measuring method and shape measuring device, position control method, stage device, exposure apparatus and method for producing exposure apparatus, and device and method for manufacturing device'2002RE037913'Exposure method and projection exposure apparatus'20026,462,807'Projection exposure apparatus and method'20026,433,872'Exposure method and apparatus'20026,414,743'Exposure apparatus, exposure method using the same and method of manufacture of circuit device'20026,411,386'Aligning apparatus and method for aligning mask patterns with regions on a substrate'20026,400,445'Method and apparatus for positioning substrate'20026,400,441'Projection exposure apparatus and method'20026,396,071'Scanning exposure method and apparatus'20026,396,568'Exposure apparatus and method'20026,388,734'Projection exposure apparatus'20026,341,007'Exposure apparatus and method'20026,335,787'Projection exposure apparatus'20026,331,885'Stage apparatus, scanning type exposure apparatus, and device produced with the same'20016,327,022'Projection exposure method and apparatus'20016,319,895'Lactoferrin tablets'2001RE037391'Exposure method and projection exposure apparatus'20016,279,881'Method and apparatus which exposes a second object with a pattern formed on a first object and which performs statistical calculation based on position information of marks on the first object'20016,238,851'Exposure method'20016,235,063'Fiber treating composition'20016,225,012'Method for positioning substrate'20016,198,527'Projection exposure apparatus and exposure method'20016,151,102'Projection exposure apparatus'20006,141,107'Apparatus for detecting a position of an optical mark'20006,115,107'Exposure apparatus'20006,100,515'Scanning exposure method and apparatus in which a mask and a substrate are moved at different scan velocities and exposure parameters are varied'2000RE036799'Projection optical apparatus using plural wavelengths of light'2000RE036730'Projection exposure apparatus having an off-axis alignment system and method of alignment therefor'20006,051,843'Exposure apparatus and method which synchronously moves the mask and the substrate to measure displacement'20006,002,467'Exposure apparatus and method'19995,995,263'Projection exposure apparatus'19995,995,234'Method and apparatus for the alignment of a substrate'19995,994,006'Projection exposure methods'19995,991,009'Illumination optical apparatus using different number of light sources under different exposure modes, method of operating and method of manufacturing thereof'19995,959,721'Projection exposure apparatus and projection exposure method'19995,894,341'Exposure apparatus and method for measuring a quantity of light with temperature variations'19995,892,572'Projection exposure apparatus and method'19995,883,704'Projection exposure apparatus wherein focusing of the apparatus is changed by controlling the temperature of a lens element of the projection optical system'19995,861,944'Exposure apparatus'19995,854,671'Scanning exposure method and apparatus therefor and a projection exposure apparatus and method which selectively chooses between static exposure and scanning exposure'19985,842,824'Substrate transport apparatus'19985,844,247'Exposure apparatus and method which synchronously moves the mask and the substrate to measure displacement'19985,815,248'Illumination optical apparatus and method having a wavefront splitter and an optical integrator'19985,815,249'Illumination optical apparatus and method having a wavefront splitter and an optical integrator'19985,798,195'Stepping accuracy measuring method'19985,793,474'Exposure apparatus wherein a wafer contact portion of a movable stage includes linear ridges'19985,760,454'Pattern form of an active region of a MOS type semiconductor device'19985,739,899'Projection exposure apparatus correcting tilt of telecentricity'19985,737,441'Aligning method and apparatus'19985,734,478'Projection exposure apparatus'19985,693,439'Exposure method and apparatus'19975,682,243'Method of aligning a substrate'19975,674,651'Alignment method for use in an exposure system'19975,657,129'Method and apparatus for the alignment of a substrate'19975,646,413'Exposure apparatus and method which synchronously moves the mask and the substrate to measure displacement'19975,634,231'Semiconductor manufacturing apparatus'19975,591,958'Scanning exposure method and apparatus'19975,561,606'Method for aligning shot areas on a substrate'19965,559,582'Exposure apparatus'19965,539,497'Projection exposure apparatus and exposure method'19965,493,403'Method and apparatus for the alignment of a substrate'19965,477,304'Projection exposure apparatus'19955,473,410'Projection exposure apparatus'19955,473,435'Method of measuring the bent shape of a movable mirror of an exposure apparatus'19955,469,260'Stage-position measuring apparatus'19955,464,715'Method of driving mask stage and method of mask alignment'19955,448,332'Exposure method and apparatus'19955,440,138'Exposure method'19955,272,501'Projection exposure apparatus'19935,243,195'Projection exposure apparatus having an off-axis alignment system and method of alignment therefor'19935,214,489'Aligning device for exposure apparatus'19935,194,893'Exposure method and projection exposure apparatus'19935,138,176'Projection optical apparatus using plural wavelengths of light'19925,114,224'Automatic follow-up projecting system'19925,003,342'Exposure apparatus'19915,001,870'Method of cutting and disassembling cylindrical structure'19914,962,318'Alignment system for exposure apparatus'19904,952,815'Focusing device for projection exposure apparatus'19904,897,553'Projection exposure apparatus'19904,880,310'Optical device for alignment in a projection exposure apparatus'19894,856,905'Projection exposure apparatus'19894,829,193'Projection optical apparatus with focusing and alignment of reticle and wafer marks'19894,794,426'Alignment apparatus'19884,780,616'Projection optical apparatus for mask to substrate alignment'19884,739,373'Projection exposure apparatus'19884,688,648'Method of and apparatus for crushing earth under the ground'1987

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1987–1991Patents assigned to KAJIMA CORP (2)· patent assignee history
1987–2005Based in Tokyo, JP· patent location history
1988–2007Patents assigned to NIKON CORP (118)· patent assignee history
1988–2006Patents assigned to NIPPON KOGAKU KK (13)· patent assignee history
1988–2006Based in Kawasaki, JP· patent location history
1995–2012Based in Yokohama, JP· patent location history
1997–2005Based in Kanagawa, JP· patent location history
2001–2006Patents assigned to MORINAGA MILK INDUSTRY CO LTD (2)· patent assignee history
2006–2017Patents assigned to NISHI KENJI (6)· patent assignee history
2016–2021Based in Kumamoto, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NIKON CORP1181988–2007
NIPPON KOGAKU KK131988–2006
NISHI KENJIself62006–2017
KAJIMA CORP21987–1991
MORINAGA MILK INDUSTRY CO LTD22001–2006
Locations
LocationPatentsSpan
Yokohama, JP711995–2012
Kawasaki, JP361988–2006
Kanagawa, JP201997–2005
Tokyo, JP111987–2005
Kumamoto, JP22016–2021