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Inventor

Oktay Yildirim

Inventor
Eindhoven, NL

Overview

2→
Patents
2016–2019
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices67%
B82YSpecific uses or applications of nanostructures33%
PatentTitleYear
10,416,555Lithographic patterning process and resists to use therein20199,235,125'Methods of providing patterned chemical epitaxy templates for self-assemblable block copolymers for use in device lithography'2016

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2016–2019Patents assigned to ASML NETHERLANDS BV (2)· patent assignee history
2016–2019Based in Eindhoven, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV22016–2019
Locations
LocationPatentsSpan
Eindhoven, NL22016–2019