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Inventor

Isamu Hiraoka

Inventor
Akigawa, JP

Overview

2→
Patents
1986–1989
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Cprimary
H01CResistors29%
B22FWorking metallic powder14%
C03CChemical composition of glasses, glazes or vitreous enamels14%
H01BCables14%
H05KPrinted circuits14%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
PatentTitleYear
4,842,654'Method of heat treatment of low melting-point metal on an electrode of a chip part'19894,603,007'Paste for forming a thick conductive film'1986

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1986Patents assigned to SHIMOMOTO GIKEN CO LTD (1)· patent assignee history
1986Patents assigned to SUMITOMO METAL MINING CO (1)· patent assignee history
1986Based in Ashiya, JP· patent location history
1989Patents assigned to MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (1)· patent assignee history
1989Based in Akigawa, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD11989
SHIMOMOTO GIKEN CO LTD11986
SUMITOMO METAL MINING CO11986
Locations
LocationPatentsSpan
Akigawa, JP11989
Ashiya, JP11986