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Inventor

Naoki Takayama

Inventor
Kofu, JP

Overview

22→
Patents
1988–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 22 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps24%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%
C23CCoating metallic material7%
Y10TTechnical subjects covered by former us classification7%
B21BRolling of metal4%
B22DCasting of metals4%
B25JManipulators4%
C21DModifying the physical structure of ferrous metals4%
C22CAlloys4%
G01LMeasuring force, stress, torque, work, mechanical power, mechanical efficiency, or fluid pressure4%
PatentTitleYear
11,035,018Abrasion-resistant steel plate and method of producing abrasion-resistant steel plate202111,035,017Abrasion-resistant steel plate and method of producing abrasion-resistant steel plate202110,974,386Robot simulation apparatus and robot simulation method202110,864,636Robot setting apparatus, robot setting method, robot setting program, computer readable recording medium, and apparatus storing program202010,254,184Semiconductor pressure sensor201910,175,073Differential pressure detection element, flow rate measurement device, and method of manufacturing differential pressure detection element2019RE040046'Processing system'2008RE039969'Processing system'20087,313,451'Plasma processing method, detecting method of completion of seasoning, plasma processing apparatus and storage medium'2007RE039939'Processing system'20076,985,215'Plasma processing method and plasma processing apparatus'20066,334,983'Processing system'20026,195,223'Cartridge insertion/discharge opening structure of recording/reproduction unit for library apparatus, and library apparatus'20016,061,321'Deck lock mechanism and library apparatus'20005,343,047'Ion implantation system'19945,306,921'Ion implantation system using optimum magnetic field for concentrating ions'19945,252,892'Plasma processing apparatus'19935,101,110'Ion generator'19925,097,179'Ion generating apparatus'19925,089,747'Electron beam excitation ion source'19925,028,791'Electron beam excitation ion source'19914,749,912'Ion-producing apparatus'1988

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1988–2008Patents assigned to TOKYO ELECTRON LTD (14)· patent assignee history
1988–2008Based in Kofu, JP· patent location history
2000–2001Patents assigned to FUJITSU LTD (2)· patent assignee history
2000–2001Based in Inagi, JP· patent location history
2006–2007Based in Nirasaki, JP· patent location history
2019Patents assigned to FUJIKURA LTD (2)· patent assignee history
2020–2021Patents assigned to KEYENCE CO LTD (2)· patent assignee history
2020–2021Based in Osaka, JP· patent location history
2021Patents assigned to JFE STEEL CORP (2)· patent assignee history
2021Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO ELECTRON LTD141988–2008
FUJIKURA LTD22019
FUJITSU LTD22000–2001
JFE STEEL CORP22021
KEYENCE CO LTD22020–2021
Locations
LocationPatentsSpan
Kofu, JP111988–2008
Tokyo, JP22021
Osaka, JP22020–2021
Nirasaki, JP22006–2007
Inagi, JP22000–2001