Inventor
Christopher Charles Ward
Inventor
Somerville, MA, US
Overview
Patents· 18 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices59%
H01LSemiconductor devices7%
H10DInorganic electric semiconductor devices7%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h107%
F16FSprings4%
G01BMeasuring length, thickness or similar linear dimensions4%
H10BElectronic memory devices4%
PatentTitleYear
10,930,753Trench isolation for advanced integrated circuit structure fabrication202110,892,223Advanced lithography and self-assembled devices202110,788,763Lithographic apparatus202010,642,166Patterning device cooling apparatus202010,423,081Reticle cooling by non-uniform gas flow201910,394,139Patterning device cooling apparatus201910,281,830Patterning device cooling systems in a lithographic apparatus201910,031,428Gas flow optimization in reticle stage environment20189,977,351Patterning device support, lithographic apparatus, and method of controlling patterning device temperature20189,910,368'Patterning device manipulating system and lithographic apparatuses'20189,857,694'Estimating deformation of a patterning device and/or a change in its position'20189,766,557'Patterning device support, lithographic apparatus, and method of controlling patterning device temperature'20179,740,112'Patterning device support and lithographic apparatus'20179,632,429'Real-time reticle curvature sensing'20179,632,433'Patterning device support, lithographic apparatus, and method of controlling patterning device temperature'20179,632,434'Reticle cooling system in a lithographic apparatus'20179,513,568'Lithographic apparatus'20169,329,502'Lithographic apparatuses and methods for compensating for eigenmode coupling'2016Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2016–2020Patents assigned to ASML HOLDING NV (16)· patent assignee history
2016–2020Patents assigned to ASML NETHERLANDS BV (16)· patent assignee history
2016–2020Based in Somerville, MA, US· patent location history
2017Patents assigned to ASML NETHERLANDS N V (1)· patent assignee history
2018–2020Based in Kensington, CA, US· patent location history
2019Based in Wilton, CT, US· patent location history
2021Patents assigned to INTEL CORP (2)· patent assignee history
2021Based in Hillsboro, OR, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML HOLDING NV | 16 | 2016–2020 |
| ASML NETHERLANDS BV | 16 | 2016–2020 |
| INTEL CORP | 2 | 2021 |
| ASML NETHERLANDS N V | 1 | 2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| Somerville, Massachusetts, US | 11 | 2016–2020 |
| Kensington, California, US | 4 | 2018–2020 |
| Hillsboro, OR, US | 2 | 2021 |
| Wilton, CT, US | 1 | 2019 |