Inventor

Bavo Muys

Inventor
Mortsel, BE

Overview

15→
Patents
1993–2007
Patent span
General tagging of new technological developments
Primary field (CPC Y)

Patents· 15 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Cprimary
G03CPhotosensitive materials for photographic purposes13%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests11%
Y10TTechnical subjects covered by former us classification11%
H01BCables10%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds8%
C09KMaterials for miscellaneous applications, not provided for elsewhere8%
H01GCapacitors6%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution6%
C09DCoating compositions, e.g. paints, varnishes or lacquers5%
B41NPrinting plates or foils3%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1993–2000Patents assigned to AGFA GEVAERT NV (6)· patent assignee history
1993–2001Based in Mortsel, BE· patent location history
1994–1995Patents assigned to AGFA GEVAERT AG (2)· patent assignee history
1995Based in Morstel, BE· patent location history
1998–2000Patents assigned to BAYER AG (2)· patent assignee history
2000–2007Based in Eppegem, BE· patent location history
2001Patents assigned to AGFA GEVAERT (2)· patent assignee history
2002Patents assigned to AGFA GAVAERT (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
AGFA GEVAERT NV61993–2000
AGFA GEVAERT22001
AGFA GEVAERT AG21994–1995
BAYER AG21998–2000
AGFA GAVAERT12002
Locations
LocationPatentsSpan
Mortsel, BE91993–2001
Eppegem, BE52000–2007
Morstel, BE11995