Inventor
Richard Novak
Inventor
Plymouth, MN, US
Overview
26→
Patents
1977–2019
Patent span
General tagging of new technological developments
Primary field (CPC Y)
Patents· 26 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1019%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests17%
B08BCleaning in general7%
C30BSingle-crystal growth7%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices7%
Y10TTechnical subjects covered by former us classification7%
B01DSeparation4%
B01FMixing, e.g. dissolving, emulsifying or dispersing4%
F16LPipes4%
B01LChemical or physical laboratory apparatus for general use2%
PatentTitleYear
10,202,569Radial microfluidic devices and methods of use20199,656,197'Systems and methods for conditioning a filter assembly'20178,741,066'Method for cleaning substrates utilizing surface passivation and/or oxide layer growth to protect from pitting'20147,169,253'Process sequence for photoresist stripping and/or cleaning of photomasks for integrated circuit manufacturing'20076,928,750'Membrane dryer'20056,863,836'Method for removal of photoresist using sparger'20056,842,998'Membrane dryer'20056,840,250'Nextgen wet process tank'20056,837,944'Cleaning and drying method and apparatus'20056,818,563'Process and apparatus for removal of photoresist from semiconductor wafers using spray nozzles'20046,766,818'Chemical concentration control device'20046,649,018'System for removal of photoresist using sparger'20036,626,189'Method of processing substrates using pressurized mist generation'20036,532,974'Process tank with pressurized mist generation'20035,458,724'Etch chamber with gas dispersing membrane'19955,454,677'High temperature ceramic nut'19955,437,710'Chemical processing system for maintaining concentration of semiconductor processing solution'19955,332,271'High temperature ceramic nut'19945,247,954'Megasonic cleaning system'19935,234,540'Process for etching oxide films in a sealed photochemical reactor'19935,228,206'Cluster tool dry cleaning system'19934,900,395'HF gas etching of wafers in an acid processor'19904,271,129'Heat radiation deflectors within an EFG crucible'19814,251,206'Apparatus for and method of supporting a crucible for EFG growth of sapphire'19814,222,502'Meter and dispensing system for abrasive materials'19804,018,692'Composition for making garnet films for improved magnetic bubble devices'1977Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1977–1981Patents assigned to RCA CORP (4)· patent assignee history
1977–1981Based in East Windsor, NJ, US· patent location history
1990–1995Patents assigned to FSI INT INC (2)· patent assignee history
1990–2017Based in Plymouth, MN, US· patent location history
1993–1995Patents assigned to SUBMICRON SYSTEMS INC (6)· patent assignee history
2003–2005Patents assigned to AKRION LLC (10)· patent assignee history
2014Patents assigned to AKRION SYSTEMS LLC (1)· patent assignee history
2019Based in Jamaica Plain, MA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| AKRION LLC | 10 | 2003–2005 |
| SUBMICRON SYSTEMS INC | 6 | 1993–1995 |
| RCA CORP | 4 | 1977–1981 |
| FSI INT INC | 2 | 1990–1995 |
| AKRION SYSTEMS LLC | 1 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Plymouth, Minnesota, US | 21 | 1990–2017 |
| East Windsor, New Jersey, US | 4 | 1977–1981 |
| Jamaica Plain, Massachusetts, US | 1 | 2019 |