Inventor
Hideo Komatsu
Inventor
Tokyo, JP
Overview
Patents· 16 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1018%
C23FNon-mechanical removal of metallic material from surface11%
C08JWorking-up7%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests7%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry5%
B29CShaping or joining of plastics5%
B29KIndexing scheme associated with subclasses b29b, b29c or b29d, relating to moulding materials or to materials for moulds, reinforcements, fillers or preformed parts, e.g. inserts5%
C02FTreatment of water, waste water, sewage, or sludge5%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients5%
C12MApparatus for enzymology or microbiology5%
PatentTitleYear
7,914,708'Conductive masterbatch and resin composition including the same'20116,149,848'Methods for preparing conductive thermoplastic resin compositions and electric conductors'20005,876,647'Method for preparing conductive thermoplastic resin compositions'19995,127,987'Continuous etching process and apparatus therefor'19924,581,101'Dry-etching process'19864,555,542'Polyester-polyether copolymer composition'19854,531,009'Process for preparing .alpha.,.omega.-bis(2-chlorophenoxy)alkane-4,4\'-dicarboxylic acid or its lower alkyl ester'19854,511,429'Process for dry etching of aluminum and its alloy'19854,454,038'Apparatus for biological treatment of waste water in downflow operation'19844,412,119'Method for dry-etching'19834,352,974'Plasma etcher having isotropic subchamber with gas outlet for producing uniform etching'19824,308,089'Method for preventing corrosion of Al and Al alloys'19814,289,188'Method and apparatus for monitoring etching'19814,267,013'Method for dry-etching aluminum and aluminum alloys'19814,256,573'Process for biological treatment of waste water in downflow operation'19814,035,441'Polyester filament having excellent antistatic properties and process for preparing the same'1977Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1977–1985Patents assigned to TORAY INDUSTRIES (3)· patent assignee history
1981–1985Patents assigned to HITACHI LTD (6)· patent assignee history
1981–1984Patents assigned to CHIYODA CHEM ENG CONSTRUCT CO (2)· patent assignee history
1981–2011Based in Tokyo, JP· patent location history
1981–1983Based in Hinode, JP· patent location history
1981Based in Mitaka, JP· patent location history
1985Based in Ehime, JP· patent location history
1986–1992Patents assigned to KOKUSAI ELECTRIC CO LTD (2)· patent assignee history
1986Based in Hamura, JP· patent location history
1999–2011Patents assigned to LION CORP (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI LTD | 6 | 1981–1985 |
| LION CORP | 3 | 1999–2011 |
| TORAY INDUSTRIES | 3 | 1977–1985 |
| CHIYODA CHEM ENG CONSTRUCT CO | 2 | 1981–1984 |
| KOKUSAI ELECTRIC CO LTD | 2 | 1986–1992 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 7 | 1981–2011 |
| Hinode, JP | 4 | 1981–1983 |
| Ehime, JP | 2 | 1985 |
| Hamura, JP | 1 | 1986 |
| Mitaka, JP | 1 | 1981 |