Inventor
Conrad G. Houle
Inventor
Webster, NY, US
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices27%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests27%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds18%
G03CPhotosensitive materials for photographic purposes18%
G11BInformation storage based on relative movement between record carrier and transducer9%
PatentTitleYear
4,663,268'High-temperature resistant photoresists featuring maleimide binders'19874,366,228'Photopolymerizable compositions featuring novel co-initiators'19824,289,844'Photopolymerizable compositions featuring novel co-initiators'19814,270,130'Thermal deformation record device with bleachable dye'19814,137,079'Antifoggants in heat developable photographic materials'1979Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1979–1987Patents assigned to EASTMAN KODAK CO (5)· patent assignee history
1979–1987Based in Webster, NY, US· patent location history
1982Based in Rochester, NY, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| EASTMAN KODAK CO | 5 | 1979–1987 |
Locations
| Location | Patents | Span |
|---|---|---|
| Webster, New York, US | 4 | 1979–1987 |
| Rochester, New York, US | 1 | 1982 |