Inventor
Kenichiro Yamanishi
Inventor
Amagasaki, JP
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material35%
B25BTools or bench devices not otherwise provided for, for fastening, connecting, disengaging, or holding12%
H01JElectric discharge tubes or discharge lamps12%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1012%
Y10TTechnical subjects covered by former us classification12%
B05BSpraying apparatus6%
H05HPlasma technique6%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h106%
PatentTitleYear
5,976,260'Semiconductor producing apparatus, and wafer vacuum chucking device, gas cleaning method and nitride film forming method in semiconductor producing apparatus'19995,534,073'Semiconductor producing apparatus comprising wafer vacuum chucking device'19965,525,158'Thin film deposition apparatus'19965,099,791'Cluster beam thin film deposition apparatus with thermionic electron control'19924,811,690'Thin film deposition apparatus'19894,812,326'Evaporation source with a shaped nozzle'1989Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1989–1999Patents assigned to MITSUBISHI ELECTRIC CORP (6)· patent assignee history
1989–1999Based in Amagasaki, JP· patent location history
1989–1996Based in Hyogo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MITSUBISHI ELECTRIC CORP | 6 | 1989–1999 |
Locations
| Location | Patents | Span |
|---|---|---|
| Amagasaki, JP | 3 | 1989–1999 |
| Hyogo, JP | 3 | 1989–1996 |