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Inventor

Hiroyoshi Murota

Inventor
Fuchu, JP

Overview

2→
Patents
1993–1994
Patent span
Chemistry
Primary field (CPC C)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material50%
C30BSingle-crystal growth25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
PatentTitleYear
5,284,521'Vacuum film forming apparatus'19945,234,862'Thin film deposition method'1993

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1993–1994Patents assigned to ANELVA CORP (2)· patent assignee history
1993–1994Patents assigned to NEC CORP (2)· patent assignee history
1993–1994Based in Fuchu, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ANELVA CORP21993–1994
NEC CORP21993–1994
Locations
LocationPatentsSpan
Fuchu, JP21993–1994