Inventor
YUTAKA MOTOYAMA
Inventor
JP
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1032%
C23CCoating metallic material27%
H01LSemiconductor devices27%
C30BSingle-crystal growth5%
H10BElectronic memory devices5%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h105%
PatentTitleYear
12,191,140Method for manufacturing semiconductor device and substrate processing apparatus202512,131,947Method for manufacturing semiconductor device and substrate processing apparatus202412,027,384Heat treatment apparatus and dummy substrate processing method202411,851,752Method for forming silicon film and processing apparatus202311,807,938Exhaust device, processing system, and processing method202311,587,787Film forming method and film forming apparatus202311,239,076Film forming method and heat treatment apparatus2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2025Patents assigned to TOKYO ELECTRON LTD (7)· patent assignee history
2022–2025Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 7 | 2022–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 7 | 2022–2025 |