Inventor

Jui-Ching Wu

Inventor

Hsinchu, TW

Overview

14→

Patents

2013–2020

Patent span

Electricity

Primary field (CPC H)

Patents· 14 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices31%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%

H01LSemiconductor devices17%

G02BOptical elements, systems or apparatus6%

G21KHandling of particles or ionising radiation not otherwise provided for6%

B08BCleaning in general3%

B65DContainers for storage or transport of articles or materials, e.g. bags, barrels, bottles, boxes, cans, cartons, crates, drums, jars, tanks, hoppers, forwarding containers3%

G08BSignalling systems, e.g. personal calling systems3%

H02JElectric power networks3%

H02MApparatus for conversion between ac and ac, between ac and dc, or between dc and dc, and for use with mains or similar power supply systems3%

PatentTitleYear

10,685,846Semiconductor integrated circuit fabrication with pattern-reversing process2020 10,559,171Electronic system sharing power with doorbell and power-supply method thereof2020 10,459,353Lithography system with an embedded cleaning module2019 10,274,838System and method for performing lithography process in semiconductor device fabrication2019 10,067,418Particle removal system and method thereof2018 9,665,007'Rotary EUV collector'2017 9,558,944'System, method and reticle for improved pattern quality in extreme ultraviolet (EUV) lithography and method for forming the reticle'2017 9,429,858'Rotary EUV collector'2016 9,412,632'Reticle pod'2016 9,229,326'Method for integrated circuit patterning'2016 9,159,559'Lithography layer with quenchers to prevent pattern collapse'2015 9,140,987'Method for lithography patterning'2015 9,046,776'System, method and reticle for improved pattern quality in extreme ultraviolet (EUV) lithography and method for forming the reticle'2015 8,563,231'Patterning process and materials for lithography'2013

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2013–2016Patents assigned to TAIWAN SEMICONDUCTOR MFG (4)· patent assignee history

2013Patents assigned to JUNG AI-JEN (1)· patent assignee history

2013Patents assigned to KAO KO-BIN (1)· patent assignee history

2013–2020Based in Hsinchu, TW· patent location history

2015–2020Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (9)· patent assignee history

2020Patents assigned to CHICONY ELECTRONICS CO LTD (1)· patent assignee history

2020Based in New Taipei, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
TAIWAN SEMICONDUCTOR MFG CO LTD	9	2015–2020
TAIWAN SEMICONDUCTOR MFG	4	2013–2016
CHICONY ELECTRONICS CO LTD	1	2020
JUNG AI-JEN	1	2013
KAO KO-BIN	1	2013

Locations

Location	Patents	Span
Hsinchu, TW	13	2013–2020
New Taipei, TW	1	2020