Inventor
David DeKraker
Inventor
Burnsville, MN, US
Overview
Patents· 14 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1041%
H01LSemiconductor devices26%
B05BSpraying apparatus15%
B08BCleaning in general6%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices6%
G05BControl or regulating systems in general3%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h103%
PatentTitleYear
9,887,107'Methodologies for rinsing tool surfaces in tools used to process microelectronic workpieces'20189,831,107Processing system and method for providing a heated etching solution20179,666,456'Method and apparatus for treating a workpiece with arrays of nozzles'20179,412,639'Method of using separate wafer contacts during wafer processing'20169,412,628'Acid treatment strategies useful to fabricate microelectronic devices and precursors thereof'20169,263,303'Methodologies for rinsing tool surfaces in tools used to process microelectronic workpieces'20168,978,675'Method and apparatus for treating a workpiece with arrays of nozzles'20158,967,167'Barrier structure and nozzle device for use in tools used to process microelectronic workpieces with one or more treatment fluids'20158,920,577'Process for treatment of substrates with water vapor or steam'20148,668,778'Method of removing liquid from a barrier structure'20148,387,635'Barrier structure and nozzle device for use in tools used to process microelectronic workpieces with one or more treatment fluids'20138,142,571'Process for treatment of semiconductor wafer using water vapor containing environment'20127,913,706'Rinsing methodologies for barrier plate and venturi containment systems in tools used to process microelectronic workpieces with one or more treatment fluids, and related apparatuses'20117,819,984'Process for treatment of substrates with water vapor or steam'2010Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2010–2015Patents assigned to FSI INT INC (6)· patent assignee history
2010–2018Based in Burnsville, MN, US· patent location history
2012–2016Patents assigned to DEKRAKER DAVID (4)· patent assignee history
2012Patents assigned to CHRISTENSON KURT K (1)· patent assignee history
2013–2018Patents assigned to TEL FSI INC (11)· patent assignee history
2014Patents assigned to BUTTERBAUGH JEFFERY W (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TEL FSI INC | 11 | 2013–2018 |
| FSI INT INC | 6 | 2010–2015 |
| DEKRAKER DAVIDself | 4 | 2012–2016 |
| BUTTERBAUGH JEFFERY W | 1 | 2014 |
| CHRISTENSON KURT K | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Burnsville, Minnesota, US | 14 | 2010–2018 |