Inventor

Terry Brewer

Inventor
Rolla, MO, US

Overview

39→
Patents
1977–2005
Patent span
Physics
Primary field (CPC G)

Patents· 39 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices32%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests12%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds10%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein5%
C08JWorking-up4%
C08LCompositions of macromolecular compounds4%
C09DCoating compositions, e.g. paints, varnishes or lacquers4%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%
H10KOrganic electric solid-state devices3%
PatentTitleYear
6,936,405'Organic polymeric antireflective coatings deposited by chemical vapor deposition'20056,900,000'Organic polymeric antireflective coatings deposited by chemical vapor deposition'20056,869,747'Organic polymeric antireflective coatings deposited by chemical vapor deposition'20056,316,160'Fast-etching, thermosetting anti-reflective coatings derived from cellulosic binders'20016,080,530'Thermosetting polyester anti-reflective coatings for multilayer photoresist processes'20006,042,990'Thermosetting polyester anti-reflective coatings for multilayer photoresist processes'20005,998,090'High optical density ultra thin organic black matrix system'19995,935,760'Thermosetting polyester anti-reflective coatings for multilayer photoresist processes'19995,919,598'Method for making multilayer resist structures with thermosetting anti-reflective coatings'19995,892,096'Non-subliming mid-UV dyes and ultra-thin organic arcs having differential solubility'19995,780,201'Ultra thin photolithographically imageable organic black matrix coating material'19985,753,523'Method for making airbridge from ion-implanted conductive polymers'19985,693,691'Thermosetting anti-reflective coatings compositions'19975,688,987'Non-subliming Mid-UV dyes and ultra-thin organic arcs having differential solubility'19975,674,648'Anti-reflective coating'19975,633,465'Pirani pressure sensor'19975,629,665'Conducting-polymer bolometer'19975,578,676'Method for making polymers with intrinsic light-absorbing properties'19965,505,093'Homogeneously conductive polymer films as strain gauges'19965,401,613'Method of manufacturing microelectronic devices having multifunctional photolithographic layers'19955,368,989'Photolithographic article utilizing polymers with light-absorbing properties for anti-reflective coating'19945,362,608'Microlithographic substrate cleaning and compositions therefor'19945,340,619'Method of manufacturing a color filter array'19945,336,925'Positive working polyamic acid/imide photoresist compositions and their use as dielectrics'19945,281,690'Base-soluble polyimide release layers for use in microlithographic processing'19945,262,195'Soluble conducting polymers and their use in manufacturing electronic devices'19935,234,990'Polymers with intrinsic light-absorbing properties for anti-reflective coating applications in deep ultraviolet microlithography'19935,138,424'Positive working polyamic acid/imide photoresist compositions and their use as dielectrics'19925,110,697'Multifunctional photolithographic compositions'19925,057,399'Method for making polyimide microlithographic compositions soluble in alkaline media'19915,024,922'Positive working polyamic acid/imide and diazoquinone photoresist with high temperature pre-bake'19914,950,583'Adhesion promoting product and process for treating an integrated circuit substrate therewith'19904,910,122'Anti-reflective coating'19904,876,165'Light filters for microelectronics'19894,822,718'Light absorbing coating'19894,732,858'Adhesion promoting product and process for treating an integrated circuit substrate'19884,152,286'Composition and method for forming a doped oxide film'19794,133,907'High resolution electron beam resist'19794,061,799'Method of patterning styrene diene block copolymer electron beam resists'1977

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1977–1979Patents assigned to TEXAS INSTRUMENTS INC (3)· patent assignee history
1977–1979Based in Plano, TX, US· patent location history
1988–2005Patents assigned to BREWER SCIENCE INC (29)· patent assignee history
1988–2005Based in Rolla, MO, US· patent location history
1991Patents assigned to BREWER TERRY (2)· patent assignee history
1993–1995Patents assigned to BREWER SCIENCE (2)· patent assignee history
1998–1999Patents assigned to NISSAN CHEMICAL IND LTD (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
BREWER SCIENCE INC291988–2005
TEXAS INSTRUMENTS INC31977–1979
BREWER SCIENCE21993–1995
BREWER TERRYself21991
NISSAN CHEMICAL IND LTD21998–1999
Locations
LocationPatentsSpan
Rolla, MO, US361988–2005
Plano, Texas, US31977–1979