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Inventor

Po-Chin Chang

Inventor
Taichung, TW

Overview

4→
Patents
2016–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Lprimary
H01LSemiconductor devices33%
H10DInorganic electric semiconductor devices25%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1025%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
PatentTitleYear
10,790,195Elongated pattern and formation thereof202010,707,081Fine line patterning methods202010,692,760Semiconductor structure and method for manufacturing the same20209,520,482'Method of cutting metal gate'2016

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2016–2020Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (4)· patent assignee history
2016Based in Hsinchu, TW· patent location history
2020Based in Taichung, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TAIWAN SEMICONDUCTOR MFG CO LTD42016–2020
Locations
LocationPatentsSpan
Taichung, TW32020
Hsinchu, TW12016