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Inventor

Patrick Lomtscher

Inventor
Dresden, DE

Overview

2→
Patents
2007–2021
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G01Nprimary
G01NInvestigating or analysing materials by determining their chemical or physical properties33%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
G06FElectric digital data processing17%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
PatentTitleYear
11,092,901Wafer exposure method using wafer models and wafer fabrication assembly20217,248,351'Optimizing light path uniformity in inspection systems'2007

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2007Patents assigned to INFINEON TECHNOLOGIES AG (1)· patent assignee history
2007–2021Based in Dresden, DE· patent location history
2021Patents assigned to QONIAC GMBH (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
INFINEON TECHNOLOGIES AG12007
QONIAC GMBH12021
Locations
LocationPatentsSpan
Dresden, DE22007–2021