Inventor
Sigrid Bauer
Inventor
Paudex, CH
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices30%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds20%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests20%
C07DHeterocyclic compounds10%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds10%
H05KPrinted circuits10%
PatentTitleYear
4,871,644'Photoresist compositions with a bis-benzotriazole'19894,835,085'1,2-Naphthoquinone diazide sulfonyl ester compound with linking benzotriazole groups and light-sensitive composition with compound'19894,693,961'Photopolymerizable coating agent, a photopolymerizable material and its use'19874,624,912'Thermally transferable layers of radiation sensitive epoxy resins used to prepare protective coatings and relief images'19864,601,973'Photopolymerizable coating agent, a photopolymerizable material and its use'1986Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1986–1989Patents assigned to CIBA GEIGY CORP (5)· patent assignee history
1986–1989Based in Paudex, CH· patent location history
1986Based in Lutry, CH· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CIBA GEIGY CORP | 5 | 1986–1989 |
Locations
| Location | Patents | Span |
|---|---|---|
| Paudex, CH | 4 | 1986–1989 |
| Lutry, CH | 1 | 1986 |