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Inventor

Seiichi Tagawa

Inventor
Suita, JP

Overview

11→
Patents
2006–2020
Patent span
Chemistry
Primary field (CPC C)

Patents· 11 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices22%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
C07CAcyclic or carbocyclic compounds8%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds8%
H01LSemiconductor devices8%
C07DHeterocyclic compounds6%
F16FSprings6%
F16HGearing6%
Y10TTechnical subjects covered by former us classification6%
B82YSpecific uses or applications of nanostructures3%
PatentTitleYear
10,670,967Resist patterning method, latent resist image forming device, resist patterning device, and resist material202010,429,745Photo-sensitized chemically amplified resist (PS-CAR) simulation201910,073,349Chemically amplified resist material, pattern-forming method, compound, and production method of compound201810,073,348Resist-pattern-forming method and chemically amplified resist material201810,025,187Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting201810,025,190Substrate treatment system20189,977,332Resist patterning method, latent resist image forming device, resist patterning device, and resist material20189,971,247Pattern-forming method20187,731,927'Ceramic nanowires and a process for producing them by ion beam irradiation'20107,354,637'Damper and process thereof'20086,984,432'Damper and process thereof'2006

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2006–2008Patents assigned to FUKOKU KK (2)· patent assignee history
2006Based in Saitama, JP· patent location history
2008Based in Ageo, JP· patent location history
2010Patents assigned to JAPAN ATOMIC ENERGY AGENCY (1)· patent assignee history
2010–2020Based in Suita, JP· patent location history
2018–2020Patents assigned to UNIV OSAKA (8)· patent assignee history
2018–2019Patents assigned to TOKYO ELECTRON LTD (6)· patent assignee history
2018Patents assigned to JSR CORP (3)· patent assignee history
2019Based in Osaka, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
UNIV OSAKA82018–2020
TOKYO ELECTRON LTD62018–2019
JSR CORP32018
FUKOKU KK22006–2008
JAPAN ATOMIC ENERGY AGENCY12010
Locations
LocationPatentsSpan
Suita, JP82010–2020
Osaka, JP12019
Ageo, JP12008
Saitama, JP12006