Inventor
Noboru Moriya
Inventor
Tokorozawa, JP
Overview
Patents· 11 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G01Nprimary
G01NInvestigating or analysing materials by determining their chemical or physical properties37%
H01JElectric discharge tubes or discharge lamps37%
G02BOptical elements, systems or apparatus11%
G03HHolographic processes or apparatus11%
C12MApparatus for enzymology or microbiology5%
PatentTitleYear
9,343,260'Multipole and charged particle radiation apparatus using the same'20168,653,472'Electromagnetic field application system'20147,872,755'Interferometer'20117,834,326'Aberration corrector and charged particle beam apparatus using the same'20107,750,298'Interferometer having three electron biprisms'20107,655,905'Charged particle beam equipment'20107,538,323'Interferometer'20096,593,129'Apparatus for microinjection of sample into amphibian oocytes'20036,539,244'Automatic electrophysiological measuring apparatus/method'20036,470,201'Automatic electrophysiological measuring apparatus / method'20025,976,338'DNA analyzer'1999Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1999–2014Patents assigned to HITACHI LTD (5)· patent assignee history
1999–2014Based in Tokorozawa, JP· patent location history
2009–2011Patents assigned to RIKEN (4)· patent assignee history
2009–2011Based in Wako, JP· patent location history
2010–2016Patents assigned to HITACHI HIGH TECH CORP (2)· patent assignee history
2014–2016Patents assigned to MORIYA NOBORU (2)· patent assignee history
2014Patents assigned to HARADA KEN (1)· patent assignee history
2016Based in Tokyo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI LTD | 5 | 1999–2014 |
| RIKEN | 4 | 2009–2011 |
| HITACHI HIGH TECH CORP | 2 | 2010–2016 |
| MORIYA NOBORUself | 2 | 2014–2016 |
| HARADA KEN | 1 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokorozawa, JP | 6 | 1999–2014 |
| Wako, JP | 4 | 2009–2011 |
| Tokyo, JP | 1 | 2016 |