Inventor
Gerhard Wegner
Inventor
Mainz-Drais, DE
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B05Dprimary
B05DProcesses for applying fluent materials to surfaces, in general11%
B82YSpecific uses or applications of nanostructures11%
Y10TTechnical subjects covered by former us classification11%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests8%
C04BLime, magnesia5%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds5%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds5%
C09DCoating compositions, e.g. paints, varnishes or lacquers5%
G01NInvestigating or analysing materials by determining their chemical or physical properties5%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices5%
PatentTitleYear
6,218,468'Preparation of an aqueous polymer dispersion by the free radical aqueous emulsion polymerization method'20015,643,996'Inorganic powder composition containing polymeric auxiliaries and use thereof'19975,473,008'Casting composition for producing green ceramic sheets containing polyvinyl alcohol/fatty acid ester as dispersant'19955,304,290'Capacitively measuring chemical sensor system'19945,182,005'Reference electrode for chemical sensors'19935,120,610'Polymers having phthalocyanine units and their use as optically transparent films'19925,049,462'Reading out information stored in thin polymer layers'19915,035,762'Production of thin films'19915,035,763'Preparation of thin films'19914,886,685'Layer elements and their production'19894,828,917'Layer of metallomacrocyclic polymer on substrate'19894,789,622'Production of resist images, and a suitable dry film resist'19884,649,100'Production of resist images, and a suitable dry film resist'19874,640,960'Degradation of poly(diacetylenes)'19874,536,262'Preparation of poly(heteroaromatics), and films obtained by this method'1985Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1985–2001Patents assigned to BASF AG (13)· patent assignee history
1985–1988Based in Denzlingen, DE· patent location history
1989–1994Based in Mainz-Drais, DE· patent location history
1995–1997Patents assigned to HOECHST AG (2)· patent assignee history
1995–2001Based in Mainz, DE· patent location history
2001Patents assigned to MAX PLANCK INST (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| BASF AG | 13 | 1985–2001 |
| HOECHST AG | 2 | 1995–1997 |
| MAX PLANCK INST | 1 | 2001 |
Locations
| Location | Patents | Span |
|---|---|---|
| Mainz-Drais, DE | 8 | 1989–1994 |
| Denzlingen, DE | 4 | 1985–1988 |
| Mainz, DE | 3 | 1995–2001 |