Inventor
Susumu Goto
Inventor
Tama, JP
Overview
Patents· 18 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps28%
B82YSpecific uses or applications of nanostructures23%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices8%
G21KHandling of particles or ionising radiation not otherwise provided for8%
A01HNew plants or non-transgenic processes for obtaining them5%
G06FElectric digital data processing5%
B23PMetal-working not otherwise provided for3%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients3%
C08LCompositions of macromolecular compounds3%
C12NMicroorganisms or enzymes3%
PatentTitleYear
10,964,005Operation analysis apparatus, operation analysis method, operation analysis program, and operation analysis system20219,714,410'Cell culture method and utilization of the same'2017PP023055'Petunia plant named ‘Hoobenihime’'20128,228,547'Image source apparatus and method of acquiring information from printer'20127,960,703'Charged-particle beam lithography apparatus and device manufacturing method'20117,385,194'Charged particle beam application system'2008PP016588'Petunia plant named ‘Temari’'20067,041,988'Electron beam exposure apparatus and electron beam processing apparatus'20067,034,314'Projection apparatus for projecting a pattern formed on a mask onto a substrate and a control method for a projection apparatus'20066,831,260'Electron beam exposure apparatus, reduction projection system, and device manufacturing method'20046,452,193'Electron beam exposure apparatus, electron lens, and device manufacturing method'20026,246,065'Electron beam projection exposure apparatus'20015,929,454'Position detection apparatus, electron beam exposure apparatus, and methods associated with them'19995,864,142'Electron beam exposure apparatus and method of controlling same'19995,323,530'Apparatus for assembling rotors'19944,812,662'Alignment system using an electron beam'19894,785,187'Alignment device'19884,086,295'Polyamide composition'1978Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1978Patents assigned to ASAHI CHEMICAL IND (1)· patent assignee history
1988–2011Patents assigned to CANON KK (10)· patent assignee history
1988–1989Based in Hachiohji, JP· patent location history
1999–2006Based in Tama, JP· patent location history
2004–2017Based in Tokyo, JP· patent location history
2006–2017Patents assigned to GOTO SUSUMU (4)· patent assignee history
2006–2012Patents assigned to GOTO FUSAKO (2)· patent assignee history
2006–2012Patents assigned to GOTO KOJI (2)· patent assignee history
2008–2011Based in Utsunomiya, JP· patent location history
2021Based in Kyoto, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CANON KK | 10 | 1988–2011 |
| GOTO SUSUMUself | 4 | 2006–2017 |
| GOTO FUSAKO | 2 | 2006–2012 |
| GOTO KOJI | 2 | 2006–2012 |
| ASAHI CHEMICAL IND | 1 | 1978 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tama, JP | 5 | 1999–2006 |
| Tokyo, JP | 3 | 2004–2017 |
| Utsunomiya, JP | 2 | 2008–2011 |
| Hachiohji, JP | 2 | 1988–1989 |
| Kyoto, JP | 1 | 2021 |