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Inventor

Shih-Hsieng Huang

Inventor
Renwu Township, TW

Overview

3→
Patents
2010–2018
Patent span
Electricity
Primary field (CPC H)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Dprimary
H10DInorganic electric semiconductor devices38%
H01LSemiconductor devices25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests13%
PatentTitleYear
9,899,519'Defect-Free SiGe source/drain formation by epitaxy-free process'20188,900,980'Defect-free SiGe source/drain formation by epitaxy-free process'20147,829,978'Closed loop CESL high performance CMOS device'2010

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2010–2014Patents assigned to TAIWAN SEMICONDUCTOR MFG (2)· patent assignee history
2010–2018Based in Renwu Township, TW· patent location history
2014Patents assigned to HUANG SHIH-HSIENG (1)· patent assignee history
2014Patents assigned to WANG CHIH-HAO (1)· patent assignee history
2014Patents assigned to WANG TA-WEI (1)· patent assignee history
2018Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TAIWAN SEMICONDUCTOR MFG22010–2014
HUANG SHIH-HSIENGself12014
TAIWAN SEMICONDUCTOR MFG CO LTD12018
WANG CHIH-HAO12014
WANG TA-WEI12014
Locations
LocationPatentsSpan
Renwu Township, TW32010–2018